Ryuichi Serizawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,921,027
- Issue date Dec 30, 2014
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, polymer, and compound
- Patent number 8,507,575
- Issue date Aug 13, 2013
- JSR Corporation
- Nobuji Matsumura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING...
- Publication number 20240369931
- Publication date Nov 7, 2024
- JSR Corporation
- Yuki OZAKI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACT...
- Publication number 20240184203
- Publication date Jun 6, 2024
- JSR Corporation
- Yuki OZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
- Publication number 20240004297
- Publication date Jan 4, 2024
- JSR Corporation
- Tatsuya KASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...
- Publication number 20230250238
- Publication date Aug 10, 2023
- JSR Corporation
- Ryuichi SERIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20230093664
- Publication date Mar 23, 2023
- JSR Corporation
- Ryuichi Serizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...
- Publication number 20220403116
- Publication date Dec 22, 2022
- JSR Corporation
- Ryuichi SERIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION, FILM, METHOD OF FORMING FILM, METHOD OF FORMING PATTER...
- Publication number 20220204535
- Publication date Jun 30, 2022
- JSR Corporation
- Yuusuke OOTSUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING...
- Publication number 20220075267
- Publication date Mar 10, 2022
- JSR Corporation
- Yuusuke OOTSUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED SUBSTRATE-PRODUCING METHOD
- Publication number 20200333706
- Publication date Oct 22, 2020
- JSR Corporation
- Ryuichi SERIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD AND SUBSTRATE-TREATING METHOD
- Publication number 20200218161
- Publication date Jul 9, 2020
- JSR Corporation
- Ryuichi SERIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-CONTAINING FILM-FORMING COMPOSITION, METAL-CONTAINING FILM AN...
- Publication number 20200159121
- Publication date May 21, 2020
- JSR Corporation
- Ryuichi SERIZAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING FILM FOR EUV LITHOGRAPHY...
- Publication number 20180292753
- Publication date Oct 11, 2018
- JSR Corporation
- Hiromitsu TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST COMPOSITI...
- Publication number 20130078571
- Publication date Mar 28, 2013
- JSR Corporation
- Ryuichi SERIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120082936
- Publication date Apr 5, 2012
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND
- Publication number 20120065291
- Publication date Mar 15, 2012
- JSR Corporation
- Nobuji Matsumura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Ryuichi Serizawa

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition

Radiation-sensitive resin composition, polymer, and compound

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACT...

COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE

SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...

SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICON...

SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...

COMPOSITION, FILM, METHOD OF FORMING FILM, METHOD OF FORMING PATTER...

FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING...

PATTERNED SUBSTRATE-PRODUCING METHOD

RESIST PATTERN-FORMING METHOD AND SUBSTRATE-TREATING METHOD

METAL-CONTAINING FILM-FORMING COMPOSITION, METAL-CONTAINING FILM AN...

COMPOSITION FOR FORMING SILICON-CONTAINING FILM FOR EUV LITHOGRAPHY...

PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST COMPOSITI...

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND