Ryuji Hasemi

Person

Niigata-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Triacrylate compounds and methods for producing the same, and compo...
- Patent number 10,294,319
- Issue date May 21, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Umi Yokobori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyamide compound
- Patent number 8,835,595
- Issue date Sep 16, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Takafumi Oda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing optically active 2-alkycysteine, derivative t...
- Patent number 7,470,525
- Issue date Dec 30, 2008
- Mitsubishi Gas Chemical Company, Inc.
- Yasushi Higuchi
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
2-alkylcysteinamide or salt thereof, process for producing these, a...
- Patent number 7,208,631
- Issue date Apr 24, 2007
- Mitsubishi Gas Chemical Company, Inc.
- Yasushi Higuchi
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Cleaning liquid for semiconductor devices
- Patent number 5,972,862
- Issue date Oct 26, 1999
- Mitsubishi Gas Chemical
- Yoshimi Torii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid for semiconductor devices
- Patent number 5,962,385
- Issue date Oct 5, 1999
- Mitsubishi Gas Chemical Company, Inc.
- Taketo Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing semiconductor device and rinse for cleaning sem...
- Patent number 5,911,836
- Issue date Jun 15, 1999
- Mitsubishi Gas Chemical Company, Inc.
- Mayumi Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Removing agent composition for photoresist and method of removing
- Patent number 5,567,574
- Issue date Oct 22, 1996
- Mitsubishi Gas Chemical Company, Inc.
- Ryuji Hasemi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing dimethyl 2,6-naphthalene-dicarboxylate
- Patent number 5,436,364
- Issue date Jul 25, 1995
- Mitsubishi Gas Chemical Company, Inc.
- Seiji Uchiyama
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
TRIACRYLATE COMPOUNDS AND METHODS FOR PRODUCING THE SAME, AND COMPO...
- Publication number 20170335043
- Publication date Nov 23, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Umi YOKOBORI
- G01 - MEASURING TESTING
Information Patent Application
POLYAMIDE COMPOUND
- Publication number 20120302723
- Publication date Nov 29, 2012
- Takafumi Oda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCTION OF OPTICALLY ACTIVE AMINO ACID
- Publication number 20100105111
- Publication date Apr 29, 2010
- Mitsubishi Gas Chemical Company, Inc.
- Yasuhisa Asano
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
Process for Producing Optically Active 2-Alkylcysteine, Derivative...
- Publication number 20090030210
- Publication date Jan 29, 2009
- Mitsubishi Gas Chemical Company, Inc.
- Yasushi Higuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Process for producing optically active 2-alkycysteine, derivative t...
- Publication number 20070037260
- Publication date Feb 15, 2007
- Mitsubishi Gas Chemical Company, Inc.
- Yasushi Higuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
2-alkylcysteinamide or salt thereof, process for producing these, a...
- Publication number 20060287398
- Publication date Dec 21, 2006
- Mitsubishi Gas Chemical Company, Inc.
- Yasushi Higuchi
- C07 - ORGANIC CHEMISTRY

Ryuji Hasemi

Person

Patents Grantslast 30 patents

Triacrylate compounds and methods for producing the same, and compo...

Polyamide compound

Process for producing optically active 2-alkycysteine, derivative t...

2-alkylcysteinamide or salt thereof, process for producing these, a...

Cleaning liquid for semiconductor devices

Cleaning liquid for semiconductor devices

Method of producing semiconductor device and rinse for cleaning sem...

Removing agent composition for photoresist and method of removing

Process for producing dimethyl 2,6-naphthalene-dicarboxylate

Patents Applicationslast 30 patents

TRIACRYLATE COMPOUNDS AND METHODS FOR PRODUCING THE SAME, AND COMPO...

POLYAMIDE COMPOUND

METHOD FOR PRODUCTION OF OPTICALLY ACTIVE AMINO ACID

Process for Producing Optically Active 2-Alkylcysteine, Derivative...

Process for producing optically active 2-alkycysteine, derivative t...

2-alkylcysteinamide or salt thereof, process for producing these, a...