Ryuji KOITABASHI

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank substrate container, method for storing photomask b...
- Patent number 10,768,524
- Issue date Sep 8, 2020
- Shin-Etsu Chemical Co., Ltd.
- Shogo Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank and method for manufacturing photomask
- Patent number 9,091,931
- Issue date Jul 28, 2015
- Toppan Printing Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number 9,075,306
- Issue date Jul 7, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, processing method, and etching method
- Patent number 8,858,814
- Issue date Oct 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light pattern exposure method, photomask, and photomask blank
- Patent number 8,753,787
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light pattern exposure method, halftone phase shift mask, and halft...
- Patent number 8,753,786
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and making method, photomask, light pattern exposur...
- Patent number 8,475,978
- Issue date Jul 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation process of chemically amplified resist composition
- Patent number 8,367,295
- Issue date Feb 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, resist pattern forming process, and photomask prep...
- Patent number 8,343,694
- Issue date Jan 1, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist patterning process and manufacturing photo mask
- Patent number 8,110,335
- Issue date Feb 7, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 7,977,027
- Issue date Jul 12, 2011
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, resist composition and patterning process using the same
- Patent number 7,501,223
- Issue date Mar 10, 2009
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition and patterning pro...
- Patent number 7,312,016
- Issue date Dec 25, 2007
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition and patterning pro...
- Patent number 7,288,363
- Issue date Oct 30, 2007
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist material and pattern formation method using the same
- Patent number 6,861,198
- Issue date Mar 1, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK SUBSTRATE CONTAINER, METHOD FOR STORING PHOTOMASK B...
- Publication number 20170293220
- Publication date Oct 12, 2017
- Shin-Etsu Chemical Co., Ltd.
- Shogo ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTAINER FOR STORING PHOTOMASK BLANKS
- Publication number 20160216603
- Publication date Jul 28, 2016
- Shin-Etsu Polymer Co., Ltd.
- Tsutomu SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...
- Publication number 20130130159
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK
- Publication number 20130130160
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK
- Publication number 20120251930
- Publication date Oct 4, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSUR...
- Publication number 20120064438
- Publication date Mar 15, 2012
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...
- Publication number 20110294047
- Publication date Dec 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20110177464
- Publication date Jul 21, 2011
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD
- Publication number 20100248493
- Publication date Sep 30, 2010
- Satoshi WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist patterning process and manufacturing photo mask
- Publication number 20100009271
- Publication date Jan 14, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...
- Publication number 20080305411
- Publication date Dec 11, 2008
- Shin-Etsu Chemical Co., Ltd.
- Ryuji KOITABASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20080274422
- Publication date Nov 6, 2008
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20080241751
- Publication date Oct 2, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20080096128
- Publication date Apr 24, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel polymer, resist composition and patterning process using the...
- Publication number 20080090179
- Publication date Apr 17, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20070111139
- Publication date May 17, 2007
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive resist composition and patterning pro...
- Publication number 20070037091
- Publication date Feb 15, 2007
- Ryuji Koitabashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition and patterning process
- Publication number 20060166133
- Publication date Jul 27, 2006
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemically amplified positive resist composition and patterning pro...
- Publication number 20050233245
- Publication date Oct 20, 2005
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist material and pattern formation method using the same
- Publication number 20040023151
- Publication date Feb 5, 2004
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryuji KOITABASHI

Person

Patents Grantslast 30 patents

Photomask blank substrate container, method for storing photomask b...

Photomask blank and method for manufacturing photomask

Chemically amplified negative resist composition and patterning pro...

Photomask blank, processing method, and etching method

Light pattern exposure method, photomask, and photomask blank

Light pattern exposure method, halftone phase shift mask, and halft...

Photomask blank and making method, photomask, light pattern exposur...

Preparation process of chemically amplified resist composition

Photomask blank, resist pattern forming process, and photomask prep...

Resist patterning process and manufacturing photo mask

Resist composition and patterning process

Polymer, resist composition and patterning process using the same

Chemically amplified positive resist composition and patterning pro...

Chemically amplified positive resist composition and patterning pro...

Negative resist material and pattern formation method using the same

Patents Applicationslast 30 patents

PHOTOMASK BLANK SUBSTRATE CONTAINER, METHOD FOR STORING PHOTOMASK B...

CONTAINER FOR STORING PHOTOMASK BLANKS

LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...

LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK

PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSUR...

PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD

Resist patterning process and manufacturing photo mask

PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...

PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

RESIST COMPOSITION AND PATTERNING PROCESS

Novel polymer, resist composition and patterning process using the...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

Chemically amplified positive resist composition and patterning pro...

Negative resist composition and patterning process

Chemically amplified positive resist composition and patterning pro...

Negative resist material and pattern formation method using the same