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Ryuji Takeda
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Kanagawa, JP
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last 30 patents
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Patent Grant
Method of and apparatus for removing metallic impurities diffused i...
Patent number
6,054,373
Issue date
Apr 25, 2000
Kabushiki Kaisha Toshiba
Hiroshi Tomita
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Manufacturing method of a silicon wafer having a controlled BMD con...
Patent number
5,788,763
Issue date
Aug 4, 1998
Toshiba Ceramics Co., Ltd.
Kenro Hayashi
C30 - CRYSTAL GROWTH