Ryujiro Udo

Person

Ushiku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 7,303,998
- Issue date Dec 4, 2007
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 6,897,403
- Issue date May 24, 2005
- Hitachi High-Technologies Corporation
- Ryujiro Udo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,838,833
- Issue date Jan 4, 2005
- Hitachi, Ltd.
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and wafer sensor module
- Patent number 6,812,725
- Issue date Nov 2, 2004
- Hitachi, Ltd.
- Ryujiro Udo
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 6,664,738
- Issue date Dec 16, 2003
- Hitachi, Ltd.
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080121344
- Publication date May 29, 2008
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080053958
- Publication date Mar 6, 2008
- Masanori Kadotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20080017107
- Publication date Jan 24, 2008
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20070240825
- Publication date Oct 18, 2007
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method for manufacturing electrosta...
- Publication number 20060121195
- Publication date Jun 8, 2006
- Ryujiro Udo
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20060042757
- Publication date Mar 2, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20050242060
- Publication date Nov 3, 2005
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20050051098
- Publication date Mar 10, 2005
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20050045104
- Publication date Mar 3, 2005
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040178177
- Publication date Sep 16, 2004
- Masanori Kadotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20040173581
- Publication date Sep 9, 2004
- Ryujiro Udo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method for manufacturing electrosta...
- Publication number 20040173469
- Publication date Sep 9, 2004
- Ryujiro Udo
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Plasma processing apparatus
- Publication number 20040163601
- Publication date Aug 26, 2004
- Masanori Kadotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040061449
- Publication date Apr 1, 2004
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040040663
- Publication date Mar 4, 2004
- Ryujiro Udo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20030160568
- Publication date Aug 28, 2003
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing apparatus and wafer sensor module
- Publication number 20030160628
- Publication date Aug 28, 2003
- Ryujiro Udo
- G01 - MEASURING TESTING

Ryujiro Udo

Person

Patents Grantslast 30 patents

Plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Semiconductor processing apparatus and wafer sensor module

Plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma processing apparatus

Wafer processing apparatus capable of controlling wafer temperature

Plasma processing apparatus and method for manufacturing electrosta...

Wafer processing apparatus capable of controlling wafer temperature

Plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and method for manufacturing electrosta...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Semiconductor processing apparatus and wafer sensor module