Ryuta Mizuochi

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film forming composition having a disulfide struc...
- Patent number 12,222,651
- Issue date Feb 11, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-resistant protective film-forming composition containing p...
- Patent number 12,077,633
- Issue date Sep 3, 2024
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition and method for forming r...
- Patent number 12,072,631
- Issue date Aug 27, 2024
- NISSAN CHEMICAL CORPORATION
- Shou Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming block copolymer layer for formation of micr...
- Patent number 12,030,974
- Issue date Jul 9, 2024
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,479,627
- Issue date Oct 25, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Film forming composition containing fluorine-containing surfactant
- Patent number 11,459,414
- Issue date Oct 4, 2022
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer film-forming composition for use in forming a microphase...
- Patent number 11,440,985
- Issue date Sep 13, 2022
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-organized film-forming composition for use in forming a micro-...
- Patent number 10,995,172
- Issue date May 4, 2021
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper-layer film forming composition and method for producing a pha...
- Patent number 10,865,262
- Issue date Dec 15, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- B32 - LAYERED PRODUCTS
Information Patent Grant
Electron beam resist underlayer film-forming composition containing...
- Patent number 10,289,002
- Issue date May 14, 2019
- Nissan Chemical Industries, Ltd.
- Yasushi Sakaida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition containing polymer which...
- Patent number 10,113,083
- Issue date Oct 30, 2018
- Nissan Chemical Industries, Ltd.
- Ryuji Ohnishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Mask blank, method for manufacturing mask blank and transfer mask
- Patent number 10,042,247
- Issue date Aug 7, 2018
- Hoya Corporation
- Takahiro Hiromatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank and transfer mask
- Patent number 9,746,764
- Issue date Aug 29, 2017
- Hoya Corporation
- Takahiro Hiromatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming antistatic film and oligomer compound
- Patent number 9,394,231
- Issue date Jul 19, 2016
- Nissan Chemical Industries, Ltd.
- Tokio Nishita
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...
- Publication number 20240302744
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240302747
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER
- Publication number 20230287165
- Publication date Sep 14, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UPPER FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING PHASE-SEPAR...
- Publication number 20230280654
- Publication date Sep 7, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PROD...
- Publication number 20230259028
- Publication date Aug 17, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230244148
- Publication date Aug 3, 2023
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER
- Publication number 20230174702
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230060697
- Publication date Mar 2, 2023
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ALICYCLIC COM...
- Publication number 20220187707
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroyuki WAKAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING P...
- Publication number 20210403635
- Publication date Dec 30, 2021
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING R...
- Publication number 20210397090
- Publication date Dec 23, 2021
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICR...
- Publication number 20210284782
- Publication date Sep 16, 2021
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT
- Publication number 20210102088
- Publication date Apr 8, 2021
- Nissan Chemical Industries, Ltd.
- Makiko UMEZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUC...
- Publication number 20210063881
- Publication date Mar 4, 2021
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...
- Publication number 20200123298
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...
- Publication number 20190359749
- Publication date Nov 28, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...
- Publication number 20190233559
- Publication date Aug 1, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK
- Publication number 20170285460
- Publication date Oct 5, 2017
- HOYA CORPORATION
- Takahiro HIROMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING...
- Publication number 20160363863
- Publication date Dec 15, 2016
- Nissan Chemical Industries, Ltd.
- Yasushi SAKAIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT
- Publication number 20160347965
- Publication date Dec 1, 2016
- Nissan Chemical Industries, Ltd.
- Makiko UMEZAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MASK BLANK AND TRANSFER MASK
- Publication number 20160274457
- Publication date Sep 22, 2016
- HOYA CORPORATION
- Takahiro HIROMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER WHICH...
- Publication number 20160186006
- Publication date Jun 30, 2016
- Nissan Chemical Industries, Ltd.
- Ryuji OHNISHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING ANTISTATIC FILM AND OLIGOMER COMPOUND
- Publication number 20150008372
- Publication date Jan 8, 2015
- Nissan Chemical Industries, Ltd.
- Tokio Nishita
- C07 - ORGANIC CHEMISTRY

Ryuta Mizuochi

Person

Patents Grantslast 30 patents

Resist underlayer film forming composition having a disulfide struc...

Chemical-resistant protective film-forming composition containing p...

Resist underlayer film-forming composition and method for forming r...

Composition for forming block copolymer layer for formation of micr...

Film forming composition containing fluorine-containing surfactant

Film forming composition containing fluorine-containing surfactant

Underlayer film-forming composition for use in forming a microphase...

Self-organized film-forming composition for use in forming a micro-...

Upper-layer film forming composition and method for producing a pha...

Electron beam resist underlayer film-forming composition containing...

Resist underlayer film-forming composition containing polymer which...

Mask blank, method for manufacturing mask blank and transfer mask

Mask blank and transfer mask

Composition for forming antistatic film and oligomer compound

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...

NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION

VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER

UPPER FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING PHASE-SEPAR...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PROD...

EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION

VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER

EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ALICYCLIC COM...

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING P...

RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING R...

COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICR...

FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT

RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUC...

SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...

UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...

UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...

MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK

ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING...

FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT

MASK BLANK AND TRANSFER MASK

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER WHICH...

COMPOSITION FOR FORMING ANTISTATIC FILM AND OLIGOMER COMPOUND