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Ryuta Shimazaki
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Shizuoka, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Method for formation of miniaturized pattern and resist substrate t...
Patent number
8,101,333
Issue date
Jan 24, 2012
AZ Electronic Materials USA Corp.
Go Noya
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
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Patent Grant
Processing liquid for resist substrate and method of processing res...
Patent number
7,998,664
Issue date
Aug 16, 2011
AZ Electronic Materials USA Corp.
Go Noya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
Processing Liquid for Resist Substrate and Method of Processing Res...
Publication number
20100233634
Publication date
Sep 16, 2010
Go Noya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Solution for treatment of resist substrate after development proces...
Publication number
20100028817
Publication date
Feb 4, 2010
Go Noya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for formation of miniaturized pattern and resist substrate t...
Publication number
20100021700
Publication date
Jan 28, 2010
Go Noya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method of forming microfined resist pattern
Publication number
20100003468
Publication date
Jan 7, 2010
Go Noya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY