S. M. Reza SADJADI

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for the deposition of a conformal film on a substrate and...
- Patent number 9,384,979
- Issue date Jul 5, 2016
- Lam Research Corporation
- Dae-Han Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer formation for array double patterning
- Patent number 8,986,492
- Issue date Mar 24, 2015
- Lam Research Corporation
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist double patterning apparatus
- Patent number 8,911,587
- Issue date Dec 16, 2014
- Lam Research Corporation
- Andrew R. Romano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device with gaps for capacitance reduction
- Patent number 8,866,202
- Issue date Oct 21, 2014
- Lam Research Corporation
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask trimming
- Patent number 8,864,931
- Issue date Oct 21, 2014
- Lam Research Corporation
- Supriya Goyal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 8,614,149
- Issue date Dec 24, 2013
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pitch reduction using oxide spacer
- Patent number 8,592,318
- Issue date Nov 26, 2013
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective layer for implant photoresist
- Patent number 8,361,564
- Issue date Jan 29, 2013
- Lam Research Corporation
- Andrew R. Romano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for the deposition of a conformal film on a substrate and...
- Patent number 8,357,434
- Issue date Jan 22, 2013
- Lam Research Corporation
- Dae-han Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench etch process for low-k dielectrics
- Patent number 6,794,293
- Issue date Sep 21, 2004
- Lam Research Corporation
- SiYi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of silicon carbide
- Patent number 6,670,278
- Issue date Dec 30, 2003
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR THE DEPOSITION OF A CONFORMAL FILM ON A SUBSTRATE AND...
- Publication number 20130074769
- Publication date Mar 28, 2013
- LAM RESEARCH CORPORATION
- Dae-Han CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Infinitely selective photoresist mask etch
- Publication number 20070193973
- Publication date Aug 23, 2007
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED PITCH REDUCTION
- Publication number 20070122977
- Publication date May 31, 2007
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of feature critical dimensions
- Publication number 20050048785
- Publication date Mar 3, 2005
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching low-k dielectric materials
- Publication number 20030024902
- Publication date Feb 6, 2003
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS

S. M. Reza SADJADI

Person

Patents Grantslast 30 patents

Apparatus for the deposition of a conformal film on a substrate and...

Spacer formation for array double patterning

Photoresist double patterning apparatus

Device with gaps for capacitance reduction

Mask trimming

Critical dimension reduction and roughness control

Pitch reduction using oxide spacer

Protective layer for implant photoresist

Apparatus for the deposition of a conformal film on a substrate and...

Trench etch process for low-k dielectrics

Method of plasma etching of silicon carbide

Patents Applicationslast 30 patents

APPARATUS FOR THE DEPOSITION OF A CONFORMAL FILM ON A SUBSTRATE AND...

Infinitely selective photoresist mask etch

SELF-ALIGNED PITCH REDUCTION

Reduction of feature critical dimensions

Method of plasma etching low-k dielectric materials