Saburo Kamiya

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Interferometric position-measuring devices and methods
- Patent number 7,876,452
- Issue date Jan 25, 2011
- Nikon Corporation
- Michael R. Sogard
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus and production method of device using the same
- Patent number 7,471,372
- Issue date Dec 30, 2008
- Nikon Corporation
- Saburo Kamiya
- G01 - MEASURING TESTING
Information Patent Grant
System and method for measuring displacement of a stage
- Patent number 7,283,200
- Issue date Oct 16, 2007
- Nikon Corporation
- Alex Ka Tim Poon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage device and exposure apparatus
- Patent number 6,897,963
- Issue date May 24, 2005
- Nikon Corporation
- Tetsuo Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, device manufacturing method and environmental c...
- Patent number 6,784,972
- Issue date Aug 31, 2004
- Nikon Corporation
- Yoshitomo Nagahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device production method in which position o...
- Patent number 6,741,358
- Issue date May 25, 2004
- Nikon Corporation
- Saburo Kamiya
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus
- Patent number 6,714,278
- Issue date Mar 30, 2004
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 6,710,854
- Issue date Mar 23, 2004
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 6,377,336
- Issue date Apr 23, 2002
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods to control the environment and exposure apparatus
- Patent number 6,002,987
- Issue date Dec 14, 1999
- Nikon Corporation
- Saburo Kamiya
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Method and apparatus for correcting linearity errors of a moving mi...
- Patent number 5,790,253
- Issue date Aug 4, 1998
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 5,719,704
- Issue date Feb 17, 1998
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder
- Patent number 5,563,683
- Issue date Oct 8, 1996
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical measuring apparatus having a partitioning wall for dividing...
- Patent number 5,550,633
- Issue date Aug 27, 1996
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual interferometer measuring system including a wavelength correct...
- Patent number 5,392,120
- Issue date Feb 21, 1995
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 5,272,501
- Issue date Dec 21, 1993
- Nikon Corporation
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and apparatus for measuring coordinate position and posit...
- Patent number 5,151,749
- Issue date Sep 29, 1992
- Nikon Corporation
- Akikazu Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser beam transmitting apparatus
- Patent number 5,018,848
- Issue date May 28, 1991
- Nikon Corporation
- Saburo Kamiya
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Projection exposure apparatus
- Patent number 4,989,031
- Issue date Jan 29, 1991
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for detecting the levelling of the surface of an object
- Patent number 4,902,900
- Issue date Feb 20, 1990
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 4,853,745
- Issue date Aug 1, 1989
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser beam working system
- Patent number 4,820,899
- Issue date Apr 11, 1989
- Nikon Corporation
- Ikuo Hikima
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Exposure method, exposure apparatus and device manufacturing method
- Publication number 20100033694
- Publication date Feb 11, 2010
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS
- Publication number 20080291464
- Publication date Nov 27, 2008
- NIKON CORPORATION
- Michael R. Sogard
- G01 - MEASURING TESTING
Information Patent Application
System and method for measuring displacement of a stage
- Publication number 20050012918
- Publication date Jan 20, 2005
- Alex Ka Tim Poon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and production method of device using the same
- Publication number 20040165166
- Publication date Aug 26, 2004
- Nikon Corporation
- Saburo Kamiya
- G01 - MEASURING TESTING
Information Patent Application
Exposure apparatus and exposure method
- Publication number 20040156026
- Publication date Aug 12, 2004
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, device manufacturing method and environmental c...
- Publication number 20020050572
- Publication date May 2, 2002
- Nikon Corporation
- Yoshitomo Nagahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure apparatus
- Publication number 20020048008
- Publication date Apr 25, 2002
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus
- Publication number 20010050759
- Publication date Dec 13, 2001
- Nikon Corporation
- Saburo Kamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Saburo Kamiya

Person

Patents Grantslast 30 patents

Interferometric position-measuring devices and methods

Exposure apparatus and production method of device using the same

System and method for measuring displacement of a stage

Stage device and exposure apparatus

Exposure apparatus, device manufacturing method and environmental c...

Exposure apparatus and device production method in which position o...

Exposure apparatus

Projection exposure apparatus

Projection exposure apparatus

Methods to control the environment and exposure apparatus

Method and apparatus for correcting linearity errors of a moving mi...

Projection exposure apparatus

Substrate holder

Optical measuring apparatus having a partitioning wall for dividing...

Dual interferometer measuring system including a wavelength correct...

Projection exposure apparatus

Method of and apparatus for measuring coordinate position and posit...

Laser beam transmitting apparatus

Projection exposure apparatus

Device for detecting the levelling of the surface of an object

Exposure apparatus

Laser beam working system

Patents Applicationslast 30 patents

Exposure method, exposure apparatus and device manufacturing method

INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS

System and method for measuring displacement of a stage

Exposure apparatus and production method of device using the same

Exposure apparatus and exposure method

Exposure apparatus, device manufacturing method and environmental c...

Projection exposure apparatus

Exposure apparatus