Saburo Kanai

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 7,565,879
- Issue date Jul 28, 2009
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,208,422
- Issue date Apr 24, 2007
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,846,363
- Issue date Jan 25, 2005
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,833,051
- Issue date Dec 21, 2004
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 6,815,365
- Issue date Nov 9, 2004
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatically attracting electrode and a method of manufacture...
- Patent number 6,583,979
- Issue date Jun 24, 2003
- Hitachi, Ltd.
- Kazue Takahasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer processing apparatus and method
- Patent number 6,549,393
- Issue date Apr 15, 2003
- Hitachi, Ltd.
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,499,424
- Issue date Dec 31, 2002
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processsing apparatus
- Patent number 6,481,370
- Issue date Nov 19, 2002
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method and plasma treatment apparatus
- Patent number 6,482,747
- Issue date Nov 19, 2002
- Hitachi, Ltd.
- Kazue Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck, and method of and apparatus for processing sam...
- Patent number 6,373,681
- Issue date Apr 16, 2002
- Hitachi, Ltd.
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 6,370,007
- Issue date Apr 9, 2002
- Hitachi, Ltd.
- Kazue Takahasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device
- Patent number 6,245,202
- Issue date Jun 12, 2001
- Hitachi, Ltd.
- Manabu Edamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck, and method of and apparatus for processing sam...
- Patent number 6,243,251
- Issue date Jun 5, 2001
- Hitachi, Ltd.
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum treatment system and its stage
- Patent number 6,235,146
- Issue date May 22, 2001
- Hitachi, Ltd.
- Masanori Kadotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,180,019
- Issue date Jan 30, 2001
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,171,438
- Issue date Jan 9, 2001
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 6,156,663
- Issue date Dec 5, 2000
- Hitachi, Ltd.
- Katsuya Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck, and method of and apparatus for processing sample
- Patent number 5,946,184
- Issue date Aug 31, 1999
- Hitachi, Ltd.
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 5,914,051
- Issue date Jun 22, 1999
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method in which a...
- Patent number 5,895,586
- Issue date Apr 20, 1999
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 5,874,012
- Issue date Feb 23, 1999
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 5,804,033
- Issue date Sep 8, 1998
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 5,785,807
- Issue date Jul 28, 1998
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatically attracting electrode and a method of manufacture...
- Patent number 5,781,400
- Issue date Jul 14, 1998
- Hitachi, Ltd.
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing apparatus and method with optica...
- Patent number 5,536,359
- Issue date Jul 16, 1996
- Hitachi, Ltd.
- Hiroki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus
- Patent number 5,520,771
- Issue date May 28, 1996
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma generating method and apparatus
- Patent number 5,276,386
- Issue date Jan 4, 1994
- Hitachi, Ltd.
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 4,971,651
- Issue date Nov 20, 1990
- Hitachi, Ltd.
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20100140224
- Publication date Jun 10, 2010
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20090289035
- Publication date Nov 26, 2009
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20070240825
- Publication date Oct 18, 2007
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20060249254
- Publication date Nov 9, 2006
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment method
- Publication number 20060060300
- Publication date Mar 23, 2006
- Kazue Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20060042757
- Publication date Mar 2, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20050236109
- Publication date Oct 27, 2005
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050064717
- Publication date Mar 24, 2005
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20050039683
- Publication date Feb 24, 2005
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20040045675
- Publication date Mar 11, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20040016508
- Publication date Jan 29, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20040009617
- Publication date Jan 15, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20030203640
- Publication date Oct 30, 2003
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment method
- Publication number 20030060054
- Publication date Mar 27, 2003
- Kazue Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR WAFER PROCESSING APPARATUS AND METHOD
- Publication number 20030030960
- Publication date Feb 13, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer processing apparatus and method
- Publication number 20030029572
- Publication date Feb 13, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20030024646
- Publication date Feb 6, 2003
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20020134510
- Publication date Sep 26, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20020124963
- Publication date Sep 12, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20020119670
- Publication date Aug 29, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20020084035
- Publication date Jul 4, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20020043338
- Publication date Apr 18, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20020042206
- Publication date Apr 11, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20020005252
- Publication date Jan 17, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20010042595
- Publication date Nov 22, 2001
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20010040009
- Publication date Nov 15, 2001
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20010037857
- Publication date Nov 8, 2001
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20010037861
- Publication date Nov 8, 2001
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck, and method of and apparatus for processing sam...
- Publication number 20010019472
- Publication date Sep 6, 2001
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatically attracting electrode and a method of manufacture...
- Publication number 20010009497
- Publication date Jul 26, 2001
- Kazue Takahasi
- H01 - BASIC ELECTRIC ELEMENTS

Saburo Kanai

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma etching apparatus and plasma etching method

Electrostatically attracting electrode and a method of manufacture...

Semiconductor wafer processing apparatus and method

Plasma processing apparatus and method

Plasma processsing apparatus

Plasma treatment method and plasma treatment apparatus

Electrostatic chuck, and method of and apparatus for processing sam...

Electrostatic chuck

Plasma treatment device

Electrostatic chuck, and method of and apparatus for processing sam...

Vacuum treatment system and its stage

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Method and apparatus for plasma processing

Electrostatic chuck, and method of and apparatus for processing sample

Microwave plasma processing method and apparatus

Plasma processing apparatus and plasma processing method in which a...

Plasma processing apparatus and plasma processing method

Microwave plasma processing method and apparatus

Microwave plasma processing method and apparatus

Electrostatically attracting electrode and a method of manufacture...

Semiconductor device manufacturing apparatus and method with optica...

Microwave plasma processing apparatus

Microwave plasma generating method and apparatus

Microwave plasma processing method and apparatus

Patents Applicationslast 30 patents

Plasma Processing Apparatus And Plasma Processing Method

Plasma Processing Apparatus And Plasma Processing Method

Wafer processing apparatus capable of controlling wafer temperature

Plasma processing apparatus and plasma processing method

Plasma treatment method

Wafer processing apparatus capable of controlling wafer temperature

Plasma etching apparatus and plasma etching method

Plasma processing apparatus

Plasma processing method

Plasma etching apparatus

Plasma etching apparatus and plasma etching method

Plasma etching apparatus and plasma etching method

Plasma etching apparatus

Plasma treatment method

SEMICONDUCTOR WAFER PROCESSING APPARATUS AND METHOD

Semiconductor wafer processing apparatus and method

Plasma etching apparatus and plasma etching method

Plasma processing apparatus and method

Plasma processing apparatus and method

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Plasma processing apparatus and method

Plasma etching apparatus and plasma etching method

Plasma etching apparatus and plasma etching method

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus

Plasma processing apparatus and method

Electrostatic chuck, and method of and apparatus for processing sam...

Electrostatically attracting electrode and a method of manufacture...