Sagy Levy

Person

Zichron, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating a nonvolatile charge trap memory device
- Patent number 8,993,453
- Issue date Mar 31, 2015
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile charge trap memory device having a high dielectric cons...
- Patent number 8,860,122
- Issue date Oct 14, 2014
- Cypress Semiconductor Corporation
- Igor Polishchuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile charge trap memory device having <100> crystal plane ch...
- Patent number 7,880,219
- Issue date Feb 1, 2011
- Cypress Semiconductor Corporation
- Igor Polishchuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon nitride films
- Patent number 7,446,063
- Issue date Nov 4, 2008
- Cypress Semiconductor Corp.
- Sagy Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stress liner for integrated circuits
- Patent number 7,384,833
- Issue date Jun 10, 2008
- Cypress Semiconductor Corporation
- Igor Polishchuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a coating having a relatively high dielectric...
- Patent number 6,884,719
- Issue date Apr 26, 2005
- Mattson Technology, Inc.
- Jane Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming dielectric films
- Patent number 6,638,876
- Issue date Oct 28, 2003
- Mattson Technology, Inc.
- Sagy Levy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
UV pretreatment process for ultra-thin oxynitride formation
- Patent number 6,451,713
- Issue date Sep 17, 2002
- Mattson Technology, Inc.
- Sing-Pin Tay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer pretreatment utilizing ultraviolet activated ch...
- Patent number 6,204,120
- Issue date Mar 20, 2001
- AG Associates (Israel) Ltd.
- Yitzhak Eric Gilboa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective hemispherical grain silicon deposition
- Patent number 6,191,011
- Issue date Feb 20, 2001
- AG Associates (Israel) Ltd.
- Yitzhak Eric Gilboa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Oxide-nitride-oxide stack having multiple oxynitride layers
- Publication number 20090179253
- Publication date Jul 16, 2009
- Cypress Semiconductor Corporation
- Sagy Levy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nonvolatile charge trap memory device having <100> crystal plane ch...
- Publication number 20080290398
- Publication date Nov 27, 2008
- Igor Polishchuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stress liner for integrated circuits
- Publication number 20070184597
- Publication date Aug 9, 2007
- Igor Polishchuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for depositing a coating having a relatively high dielectric...
- Publication number 20060110531
- Publication date May 25, 2006
- Jane P. Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing a coating having a relatively high dielectric...
- Publication number 20030031793
- Publication date Feb 13, 2003
- Mattson Technology, Inc.
- Jane P. Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming dielectric films
- Publication number 20020142624
- Publication date Oct 3, 2002
- Mattson Technology, Inc.
- Sagy Levy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Method of fabricating a nonvolatile charge trap memory device

Nonvolatile charge trap memory device having a high dielectric cons...

Nonvolatile charge trap memory device having <100> crystal plane ch...

Silicon nitride films

Stress liner for integrated circuits

Method for depositing a coating having a relatively high dielectric...

Method of forming dielectric films

UV pretreatment process for ultra-thin oxynitride formation

Semiconductor wafer pretreatment utilizing ultraviolet activated ch...

Selective hemispherical grain silicon deposition

Patents Applicationslast 30 patents

Oxide-nitride-oxide stack having multiple oxynitride layers

Nonvolatile charge trap memory device having <100> crystal plane ch...

Stress liner for integrated circuits

Method for depositing a coating having a relatively high dielectric...

Method for depositing a coating having a relatively high dielectric...

Method of forming dielectric films