Sanae Furuya

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,742,038
- Issue date Jun 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,642,244
- Issue date Feb 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,501,387
- Issue date Aug 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,475,997
- Issue date Jul 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymeric compound, positive resist composition, and method of form...
- Patent number 8,298,745
- Issue date Oct 30, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,221,956
- Issue date Jul 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,088,553
- Issue date Jan 3, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing a structure
- Patent number 8,025,923
- Issue date Sep 27, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Shigenori Fujikawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Fluorine-containing compound, resist composition for immersion expo...
- Patent number 7,989,138
- Issue date Aug 2, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing compound, resist composition for immersion expo...
- Patent number 7,914,967
- Issue date Mar 29, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition, positive resist composition for therma...
- Patent number 7,741,008
- Issue date Jun 22, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120094236
- Publication date Apr 19, 2012
- Daiju SHIONO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120077125
- Publication date Mar 29, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERIC COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORM...
- Publication number 20100124718
- Publication date May 20, 2010
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition for immersion exposure, method of forming resist...
- Publication number 20090317743
- Publication date Dec 24, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20090269694
- Publication date Oct 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20090197204
- Publication date Aug 6, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORM...
- Publication number 20090186300
- Publication date Jul 23, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...
- Publication number 20090142699
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, POSITIVE RESIST COMPOSITION FOR THERMA...
- Publication number 20090142696
- Publication date Jun 4, 2009
- Tokyo Ohika Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE
- Publication number 20090087625
- Publication date Apr 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shigenori Fujikawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM
- Publication number 20090061170
- Publication date Mar 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shigenori Fujikawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...
- Publication number 20090047602
- Publication date Feb 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Sanae Furuya

Person

Patents Grantslast 30 patents

Resist composition for immersion exposure, method of forming resist...

Resist composition for immersion exposure, method of forming resist...

Resist composition for immersion exposure, method of forming resist...

Resist composition for immersion exposure, method of forming resist...

Polymeric compound, positive resist composition, and method of form...

Resist composition for immersion exposure, method of forming resist...

Positive resist composition, method of forming resist pattern, and...

Method for manufacturing a structure

Fluorine-containing compound, resist composition for immersion expo...

Fluorine-containing compound, resist composition for immersion expo...

Positive resist composition, positive resist composition for therma...

Patents Applicationslast 30 patents

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

POLYMERIC COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORM...

Resist composition for immersion exposure, method of forming resist...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORM...

FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...

POSITIVE RESIST COMPOSITION, POSITIVE RESIST COMPOSITION FOR THERMA...

METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE

ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM

FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...