Sangchol PARK

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Suwon-si, KR

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Patents Applicationslast 30 patents

Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20250028236
- Publication date Jan 23, 2025
- Samsung SDI Co., Ltd.
- Younhee NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20230221641
- Publication date Jul 13, 2023
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20210109449
- Publication date Apr 15, 2021
- Samsung SDI Co., Ltd.
- Seunghyun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY