Sanghoon Ahn

Person

Goyang-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 12,243,777
- Issue date Mar 4, 2025
- Samsung Electronics Co., Ltd.
- Woojin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device suppressing leakage current...
- Patent number 12,125,785
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Junghoo Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming interconnect structure
- Patent number 12,080,595
- Issue date Sep 3, 2024
- Samsung Electronics Co., Ltd.
- Keunwook Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device including air gaps and method of manufact...
- Patent number 11,862,514
- Issue date Jan 2, 2024
- Samsung Electronics Co., Ltd.
- Sanghoon Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 11,823,952
- Issue date Nov 21, 2023
- Samsung Electronics Co., Ltd.
- Woojin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable resistance memory device having an anti-oxidation layer an...
- Patent number 11,723,285
- Issue date Aug 8, 2023
- Samsung Electronics Co., Ltd.
- Sanghoon Ahn
Information Patent Grant
Semiconductor devices
- Patent number 11,721,622
- Issue date Aug 8, 2023
- Samsung Electronics Co., Ltd.
- Junghoo Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,569,128
- Issue date Jan 31, 2023
- Samsung Electronics Co., Ltd.
- Woojin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device including air gaps and method of manufact...
- Patent number 11,515,201
- Issue date Nov 29, 2022
- Samsung Electronics Co., Ltd.
- Sanghoon Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable resistance memory device having an anti-oxidation layer an...
- Patent number 11,296,277
- Issue date Apr 5, 2022
- Samsung Electronics Co., Ltd.
- Sanghoon Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device and method of manufacturing the same
- Patent number 11,069,613
- Issue date Jul 20, 2021
- Samsung Electronics Co., Ltd.
- Woojin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,943,824
- Issue date Mar 9, 2021
- Samsung Electronics Co., Ltd.
- Woojin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including a capping layer
- Patent number 10,707,164
- Issue date Jul 7, 2020
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 10,566,284
- Issue date Feb 18, 2020
- Samsung Electronics Co., Ltd.
- Jun Kwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 10,497,647
- Issue date Dec 3, 2019
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming an ultra-low-k dielectric layer and dielectric l...
- Patent number 10,446,495
- Issue date Oct 15, 2019
- Samsung Electronics Co., Ltd.
- Yoonhee Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including a capping layer
- Patent number 10,269,712
- Issue date Apr 23, 2019
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarized interlayer dielectric with air gap isolation
- Patent number 10,186,485
- Issue date Jan 22, 2019
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having staggered air gaps
- Patent number 10,141,258
- Issue date Nov 27, 2018
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 9,972,528
- Issue date May 15, 2018
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including a capping layer
- Patent number 9,953,924
- Issue date Apr 24, 2018
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarized interlayer dielectric with air gap isolation
- Patent number 9,929,099
- Issue date Mar 27, 2018
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 9,911,644
- Issue date Mar 6, 2018
- Samsung Electronics Co., Ltd.
- Wookyung You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including gaps between conductive patterns
- Patent number 9,842,803
- Issue date Dec 12, 2017
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having staggered air gaps
- Patent number 9,748,170
- Issue date Aug 29, 2017
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating semiconductor devices including supporting p...
- Patent number 9,741,608
- Issue date Aug 22, 2017
- Samsung Electronics Co., Ltd.
- Kyu-Hee Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including a capping layer
- Patent number 9,711,453
- Issue date Jul 18, 2017
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional semiconductor memory device
- Patent number 9,666,525
- Issue date May 30, 2017
- Samsung Electronics Co., Ltd.
- Jeeyong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating a porous dielectric layer and a method of fabric...
- Patent number 9,576,848
- Issue date Feb 21, 2017
- Samsung Electronics Co., Ltd.
- Taejin Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 9,558,994
- Issue date Jan 31, 2017
- Samsung Electronics Co., Ltd.
- Wookyung You
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE SUPPRESSING LEAKAGE CURRENT...
- Publication number 20250014998
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- JUNGHOO SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240421206
- Publication date Dec 19, 2024
- Samsung Electronics Co., Ltd.
- Seonkyu Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20240421070
- Publication date Dec 19, 2024
- Samsung Electronics Co., Ltd.
- Sunjung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20240411227
- Publication date Dec 12, 2024
- Korea Advanced Institute of Science and Technology
- Sung Gap Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING INTERCONNECT STRUCTURE
- Publication number 20240395613
- Publication date Nov 28, 2024
- Samsung Electronics Co., Ltd.
- Keunwook SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE
- Publication number 20240096796
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Yongjin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20240087956
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Woojin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE SENSOR AND METHOD OF FABRICATING THE SAME
- Publication number 20230170376
- Publication date Jun 1, 2023
- Samsung Electronics Co., Ltd.
- KIJOONG YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230114920
- Publication date Apr 13, 2023
- Samsung Electronics Co., Ltd.
- Woojin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE INCLUDING AIR GAPS AND METHOD OF MANUFACT...
- Publication number 20230072375
- Publication date Mar 9, 2023
- Samsung Electronics Co., Ltd.
- Sanghoon AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD TH...
- Publication number 20220384340
- Publication date Dec 1, 2022
- Samsung Electronics Co., Ltd.
- JUNGHOO SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20220238433
- Publication date Jul 28, 2022
- Samsung Electronics Co., Ltd.
- Junghoo Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE RESISTANCE MEMORY DEVICE HAVING AN ANTI-OXIDATION LAYER AN...
- Publication number 20220209103
- Publication date Jun 30, 2022
- Samsung Electronics Co., Ltd.
- SANGHOON AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING INTERCONNECT STRUCTURE
- Publication number 20220068704
- Publication date Mar 3, 2022
- Samsung Electronics Co., Ltd.
- Keunwook SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20210166974
- Publication date Jun 3, 2021
- Samsung Electronics Co., Ltd.
- Woojin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20210125856
- Publication date Apr 29, 2021
- Samsung Electronics Co., Ltd.
- Sanghoon AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20210005548
- Publication date Jan 7, 2021
- Samsung Electronics Co., Ltd.
- Woojin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE RESISTANCE MEMORY DEVICE HAVING AN ANTI-OXIDATION LAYER AN...
- Publication number 20200119259
- Publication date Apr 16, 2020
- Samsung Electronics Co., Ltd.
- SANGHOON AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20200098620
- Publication date Mar 26, 2020
- Samsung Electronics Co., Ltd.
- Woojin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES INCLUDING A CAPPING LAYER
- Publication number 20190206794
- Publication date Jul 4, 2019
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20190157214
- Publication date May 23, 2019
- Samsung Electronics Co., Ltd.
- Jun Kwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING AN ULTRA-LOW-K DIELECTRIC LAYER AND DIELECTRIC L...
- Publication number 20190043809
- Publication date Feb 7, 2019
- Samsung Electronics Co., Ltd.
- Yoonhee KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices Including a Capping Layer
- Publication number 20180218980
- Publication date Aug 2, 2018
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION
- Publication number 20180174977
- Publication date Jun 21, 2018
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20180076127
- Publication date Mar 15, 2018
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS
- Publication number 20170323850
- Publication date Nov 9, 2017
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices Including a Capping Layer
- Publication number 20170278797
- Publication date Sep 28, 2017
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20170178949
- Publication date Jun 22, 2017
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION
- Publication number 20170170184
- Publication date Jun 15, 2017
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20170092578
- Publication date Mar 30, 2017
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS

Sanghoon Ahn

Person

Patents Grantslast 30 patents

Semiconductor device and method of manufacturing the same

Semiconductor integrated circuit device suppressing leakage current...

Method of forming interconnect structure

Integrated circuit device including air gaps and method of manufact...

Semiconductor device and method of manufacturing the same

Variable resistance memory device having an anti-oxidation layer an...

Semiconductor devices

Semiconductor device

Integrated circuit device including air gaps and method of manufact...

Variable resistance memory device having an anti-oxidation layer an...

Integrated circuit device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor devices including a capping layer

Semiconductor device

Semiconductor devices and methods of fabricating the same

Methods of forming an ultra-low-k dielectric layer and dielectric l...

Semiconductor devices including a capping layer

Planarized interlayer dielectric with air gap isolation

Semiconductor devices having staggered air gaps

Semiconductor devices

Semiconductor devices including a capping layer

Planarized interlayer dielectric with air gap isolation

Semiconductor devices and methods of fabricating the same

Semiconductor devices including gaps between conductive patterns

Semiconductor devices having staggered air gaps

Methods of fabricating semiconductor devices including supporting p...

Semiconductor devices including a capping layer

Three-dimensional semiconductor memory device

Method of treating a porous dielectric layer and a method of fabric...

Semiconductor devices and methods of fabricating the same

Patents Applicationslast 30 patents

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE SUPPRESSING LEAKAGE CURRENT...

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

METHOD OF FORMING INTERCONNECT STRUCTURE

INTEGRATED CIRCUIT DEVICE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

IMAGE SENSOR AND METHOD OF FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

INTEGRATED CIRCUIT DEVICE INCLUDING AIR GAPS AND METHOD OF MANUFACT...

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD TH...

SEMICONDUCTOR DEVICES

VARIABLE RESISTANCE MEMORY DEVICE HAVING AN ANTI-OXIDATION LAYER AN...

METHOD OF FORMING INTERCONNECT STRUCTURE

SEMICONDUCTOR DEVICE

INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME

INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME

VARIABLE RESISTANCE MEMORY DEVICE HAVING AN ANTI-OXIDATION LAYER AN...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICES INCLUDING A CAPPING LAYER

SEMICONDUCTOR DEVICE

METHODS OF FORMING AN ULTRA-LOW-K DIELECTRIC LAYER AND DIELECTRIC L...

Semiconductor Devices Including a Capping Layer

PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS

Semiconductor Devices Including a Capping Layer

SEMICONDUCTOR DEVICES

PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME