Sangwook Kim

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Palo Alto, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
EUV resist patterning using pulsed plasma
- Patent number 10,847,368
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGHLY SELECTIVE SILICON ETCHING
- Publication number 20230260802
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Daekyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RESIST PATTERNING USING PULSED PLASMA
- Publication number 20180292756
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Byungkook Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY