Sangya Jain

Person

Bridgewater, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Image reversal negative working photoresist containing O-quinone di...
- Patent number 5,399,456
- Issue date Mar 21, 1995
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image reversal negative working O-naphthoquinone diazide and cross-...
- Patent number 5,256,522
- Issue date Oct 26, 1993
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist article having a portable, conformable, built-on mask
- Patent number 5,240,807
- Issue date Aug 31, 1993
- Hoechst Celanese Corporation
- Sangya Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image reversal negative working o-quinone diazide and cross-linking...
- Patent number 5,217,840
- Issue date Jun 8, 1993
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing an image reversal negative photoresist having a...
- Patent number 5,019,488
- Issue date May 28, 1991
- Hoechst Celanese Corporation
- Donald C. Mammato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image reversal negative working O-quinone diazide and cross-linking...
- Patent number 4,931,381
- Issue date Jun 5, 1990
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image reversal negative working O-napthoquinone diazide and cross-l...
- Patent number 4,929,536
- Issue date May 29, 1990
- Hoechst Celanese Corporation
- Mark A. Spak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Postive working multi-level photoresist
- Patent number 4,863,827
- Issue date Sep 5, 1989
- American Hoechst Corporation
- Sangya Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysulfone barrier layer for bi-level photoresists
- Patent number 4,835,086
- Issue date May 30, 1989
- Hoechst Celanese Corporation
- Sangya Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive trisester of O-quinone diazide containing compositi...
- Patent number 4,588,670
- Issue date May 13, 1986
- American Hoechst Corporation
- Michael Kelly
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sangya Jain

Person

Patents Grantslast 30 patents

Image reversal negative working photoresist containing O-quinone di...

Image reversal negative working O-naphthoquinone diazide and cross-...

Photoresist article having a portable, conformable, built-on mask

Image reversal negative working o-quinone diazide and cross-linking...

Method of producing an image reversal negative photoresist having a...

Image reversal negative working O-quinone diazide and cross-linking...

Image reversal negative working O-napthoquinone diazide and cross-l...

Postive working multi-level photoresist

Polysulfone barrier layer for bi-level photoresists

Light-sensitive trisester of O-quinone diazide containing compositi...