Sanjay Yedur

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optimized model and parameter selection for optical metrology
- Patent number 7,092,110
- Issue date Aug 15, 2006
- Timbre Technologies, Inc.
- Raghu Balasubramanian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Edge roughness measurement in optical metrology
- Patent number 7,046,375
- Issue date May 16, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Use of scanning probe microscope for defect detection and repair
- Patent number 6,884,999
- Issue date Apr 26, 2005
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- G01 - MEASURING TESTING
Information Patent Grant
Optimization of OPC design factors utilizing an advanced algorithm...
- Patent number 6,829,380
- Issue date Dec 7, 2004
- Advanced Micro Devices, Inc.
- Bryan K. Choo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topographically aligned layers and method for adjusting the relativ...
- Patent number 6,813,574
- Issue date Nov 2, 2004
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-cleaning technique for contamination on calibration sample in SEM
- Patent number 6,635,874
- Issue date Oct 21, 2003
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G01 - MEASURING TESTING
Information Patent Grant
CVD plasma process to fill contact hole in damascene process
- Patent number 6,605,855
- Issue date Aug 12, 2003
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon nanotubes as linewidth standards for SEM & AFM
- Patent number 6,591,658
- Issue date Jul 15, 2003
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- G01 - MEASURING TESTING
Information Patent Grant
Nozzle arm movement for resist development
- Patent number 6,592,932
- Issue date Jul 15, 2003
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam SEM for sidewall imaging
- Patent number 6,566,655
- Issue date May 20, 2003
- Advanced Micro Devices, Inc.
- Bryan K. Choo
- G01 - MEASURING TESTING
Information Patent Grant
Use of multiple tips on AFM to deconvolve tip effects
- Patent number 6,545,273
- Issue date Apr 8, 2003
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G01 - MEASURING TESTING
Information Patent Grant
Nozzle arm movement for resist development
- Patent number 6,541,184
- Issue date Apr 1, 2003
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cantilever assembly and scanning tip therefor with associated optic...
- Patent number 6,479,817
- Issue date Nov 12, 2002
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- G01 - MEASURING TESTING
Information Patent Grant
Grainless material for calibration sample
- Patent number 6,459,482
- Issue date Oct 1, 2002
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon nanotube probes in atomic force microscope to detect partial...
- Patent number 6,455,847
- Issue date Sep 24, 2002
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Scanning probe microscope having optical fiber spaced from point of hp
- Patent number 6,452,161
- Issue date Sep 17, 2002
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- B82 - NANO-TECHNOLOGY
Information Patent Grant
UV-enhanced silylation process to increase etch resistance of ultra...
- Patent number 6,451,512
- Issue date Sep 17, 2002
- Advanced Micro Devices, Inc.
- Bharath Rangarajan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam flood exposure technique to reduce the carbon contami...
- Patent number 6,444,381
- Issue date Sep 3, 2002
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for facilitating uniform heating temperature of photoresist
- Patent number 6,441,349
- Issue date Aug 27, 2002
- Advanced Micro Devices
- Bharath Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of carbon nanotubes as chemical sensors by incorporation of flu...
- Patent number 6,437,329
- Issue date Aug 20, 2002
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Cleaning carbon contamination on mask using gaseous phase
- Patent number 6,423,479
- Issue date Jul 23, 2002
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using a crystallographic etched silicon sample to measure and contr...
- Patent number 6,396,059
- Issue date May 28, 2002
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple nozzles for dispensing resist
- Patent number 6,376,013
- Issue date Apr 23, 2002
- Advanced Micro Devices, Inc.
- Bharath Rangarajan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ozone cleaning of wafers
- Patent number 6,371,134
- Issue date Apr 16, 2002
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Analysis of CD-SEM signal to detect scummed/closed contact holes an...
- Patent number 6,373,053
- Issue date Apr 16, 2002
- Advanced Micro Devices, Inc.
- Bryan K. Choo
- G01 - MEASURING TESTING
Information Patent Grant
Use of carbon nanotubes to calibrate conventional tips used in AFM
- Patent number 6,354,133
- Issue date Mar 12, 2002
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Use of silicon oxynitride ARC for metal layers
- Patent number 6,326,231
- Issue date Dec 4, 2001
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle arm movement for resist development
- Patent number 6,270,579
- Issue date Aug 7, 2001
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Succinic acid production and purification
- Patent number 6,265,190
- Issue date Jul 24, 2001
- Michigan State University
- Sanjay Yedur
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Nozzle arm movement for resist development
- Patent number 6,248,175
- Issue date Jun 19, 2001
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Edge roughness measurement in optical metrology
- Publication number 20040218192
- Publication date Nov 4, 2004
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Optimized model and parameter selection for optical metrology
- Publication number 20040017575
- Publication date Jan 29, 2004
- Raghu Balasubramanian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Nozzle arm movement for resist development
- Publication number 20030068430
- Publication date Apr 10, 2003
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS
- Publication number 20010046791
- Publication date Nov 29, 2001
- RAMKUMAR SUBRAMANIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ozone cleaning of wafers
- Publication number 20010010229
- Publication date Aug 2, 2001
- R. Subramanian
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS

Sanjay Yedur

Person

Patents Grantslast 30 patents

Optimized model and parameter selection for optical metrology

Edge roughness measurement in optical metrology

Use of scanning probe microscope for defect detection and repair

Optimization of OPC design factors utilizing an advanced algorithm...

Topographically aligned layers and method for adjusting the relativ...

Self-cleaning technique for contamination on calibration sample in SEM

CVD plasma process to fill contact hole in damascene process

Carbon nanotubes as linewidth standards for SEM &#x00026; AFM

Nozzle arm movement for resist development

Multi-beam SEM for sidewall imaging

Use of multiple tips on AFM to deconvolve tip effects

Nozzle arm movement for resist development

Cantilever assembly and scanning tip therefor with associated optic...

Grainless material for calibration sample

Carbon nanotube probes in atomic force microscope to detect partial...

Scanning probe microscope having optical fiber spaced from point of hp

UV-enhanced silylation process to increase etch resistance of ultra...

Electron beam flood exposure technique to reduce the carbon contami...

System for facilitating uniform heating temperature of photoresist

Use of carbon nanotubes as chemical sensors by incorporation of flu...

Cleaning carbon contamination on mask using gaseous phase

Using a crystallographic etched silicon sample to measure and contr...

Multiple nozzles for dispensing resist

Ozone cleaning of wafers

Analysis of CD-SEM signal to detect scummed/closed contact holes an...

Use of carbon nanotubes to calibrate conventional tips used in AFM

Use of silicon oxynitride ARC for metal layers

Nozzle arm movement for resist development

Succinic acid production and purification

Nozzle arm movement for resist development

Patents Applicationslast 30 patents

Edge roughness measurement in optical metrology

Optimized model and parameter selection for optical metrology

Nozzle arm movement for resist development

USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS

Ozone cleaning of wafers

Carbon nanotubes as linewidth standards for SEM & AFM