Sanjaysingh Lalbahadoersing

Person

Helmond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of alignment, overlay, configuration of marks, manufacturin...
- Patent number 11,675,281
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Jin Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mark, overlay target, and methods of alignment and overlay
- Patent number 11,086,232
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Beniamino Sciacca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information determining apparatus and method
- Patent number 10,948,837
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- An Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment mark recovery method and lithographic apparatus
- Patent number 10,429,750
- Issue date Oct 1, 2019
- ASML Netherlands B.V.
- Cayetano Sanchez-Fabres Cobaleda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for transferring a mark pattern to a substrate, a calibratio...
- Patent number 10,191,390
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Paul Cornelis Hubertus Aben
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marker structure and method of forming the same
- Patent number 8,319,967
- Issue date Nov 27, 2012
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic apparatus
- Patent number 8,243,259
- Issue date Aug 14, 2012
- ASML Netherlands B.V.
- Vitally Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-segmented alignment mark arrangement
- Patent number 8,203,692
- Issue date Jun 19, 2012
- ASML Netherlands B.V.
- Sami Musa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method, alignment system, and product with alignment mark
- Patent number 8,072,615
- Issue date Dec 6, 2011
- ASML Netherlands B.V.
- Sami Musa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for enhanced lithographic alignment
- Patent number 7,598,024
- Issue date Oct 6, 2009
- ASML Netherlands B.V.
- Sanjaysingh Lalbahadoersing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Marker for alignment of non-transparent gate layer, method for manu...
- Patent number 7,453,161
- Issue date Nov 18, 2008
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Marker for alignment of non-transparent gate layer, method for manu...
- Patent number 7,271,073
- Issue date Sep 18, 2007
- ASML Nertherlands B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF ALIGNMENT, OVERLAY, CONFIGURATION OF MARKS, MANUFACTURIN...
- Publication number 20220252994
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- Jin DAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARK, OVERLAY TARGET, AND METHODS OF ALIGNMENT AND OVERLAY
- Publication number 20200319563
- Publication date Oct 8, 2020
- ASML NETHERLANDS B.V.
- Beniamino SCIACCA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION DETERMINING APPARATUS AND METHOD
- Publication number 20200159134
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- An GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT MARK RECOVERY METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20190171120
- Publication date Jun 6, 2019
- ASML NETHERLANDS B.V.
- Cayetano SANCHEZ-FABRES COBALEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TRANSFERRING A MARK PATTERN TO A SUBSTRATE, A CALIBRATIO...
- Publication number 20180149981
- Publication date May 31, 2018
- Paul Cornelis Hubertus ABEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARKER STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20130070226
- Publication date Mar 21, 2013
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20090316122
- Publication date Dec 24, 2009
- ASML NETHERLANDS B.V.
- Vitaliy Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUB-SEGMENTED ALIGNMENT MARK ARRANGEMENT
- Publication number 20090310113
- Publication date Dec 17, 2009
- ASML NETHERLANDS B.V.
- Sami Musa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Method, Alignment System, and Product with Alignment Mark
- Publication number 20090153861
- Publication date Jun 18, 2009
- ASML NETHERLANDS B.V.
- Sami MUSA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARKER STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20090147232
- Publication date Jun 11, 2009
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker for alignment of non-transparent gate layer, method for manu...
- Publication number 20070284697
- Publication date Dec 13, 2007
- ASML NETHERLANDS B.V.
- Richard Johannes Francisc Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for enhanced lithographic patterning
- Publication number 20070212648
- Publication date Sep 13, 2007
- ASML NETHERLANDS B.V.
- Sanjaysingh Lalbahadoersing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for enhanced lithographic alignment
- Publication number 20070212652
- Publication date Sep 13, 2007
- ASML NETHERLANDS B.V.
- Sanjaysingh Lalbahadoersing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for enhanced lithographic patterning
- Publication number 20070212649
- Publication date Sep 13, 2007
- ASML NETHERLANDS B.V.
- Sanjaysingh Lalbahadoersing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker for alignment of non-transparent gate layer, method for manu...
- Publication number 20060003540
- Publication date Jan 5, 2006
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sanjaysingh Lalbahadoersing

Person

Patents Grantslast 30 patents

Methods of alignment, overlay, configuration of marks, manufacturin...

Mark, overlay target, and methods of alignment and overlay

Information determining apparatus and method

Alignment mark recovery method and lithographic apparatus

Method for transferring a mark pattern to a substrate, a calibratio...

Marker structure and method of forming the same

Lithographic apparatus

Sub-segmented alignment mark arrangement

Alignment method, alignment system, and product with alignment mark

Method and system for enhanced lithographic alignment

Marker for alignment of non-transparent gate layer, method for manu...

Marker for alignment of non-transparent gate layer, method for manu...

Patents Applicationslast 30 patents

METHODS OF ALIGNMENT, OVERLAY, CONFIGURATION OF MARKS, MANUFACTURIN...

MARK, OVERLAY TARGET, AND METHODS OF ALIGNMENT AND OVERLAY

INFORMATION DETERMINING APPARATUS AND METHOD

ALIGNMENT MARK RECOVERY METHOD AND LITHOGRAPHIC APPARATUS

METHOD FOR TRANSFERRING A MARK PATTERN TO A SUBSTRATE, A CALIBRATIO...

MARKER STRUCTURE AND METHOD OF FORMING THE SAME

LITHOGRAPHIC APPARATUS

SUB-SEGMENTED ALIGNMENT MARK ARRANGEMENT

Alignment Method, Alignment System, and Product with Alignment Mark

MARKER STRUCTURE AND METHOD OF FORMING THE SAME

Marker for alignment of non-transparent gate layer, method for manu...

Method and system for enhanced lithographic patterning

Method and system for enhanced lithographic alignment

Method and system for enhanced lithographic patterning

Marker for alignment of non-transparent gate layer, method for manu...