Sanjeev Sapra

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Using sacrificial polymer materials in semiconductor processing
- Patent number 11,651,952
- Issue date May 16, 2023
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor structure formation
- Patent number 11,469,103
- Issue date Oct 11, 2022
- Micron Technology, Inc.
- Nicholas R. Tapias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selectively removing more-doped-silicon-dioxide relativ...
- Patent number 11,361,972
- Issue date Jun 14, 2022
- Micron Technology, Inc.
- Jerome A. Imonigie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure formation
- Patent number 11,322,388
- Issue date May 3, 2022
- Micron Technology, Inc.
- Vivek Yadav
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing applying supercritical drying
- Patent number 11,127,588
- Issue date Sep 21, 2021
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure formation
- Patent number 11,114,443
- Issue date Sep 7, 2021
- Micron Technology, Inc.
- Vivek Yadav
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Column formation using sacrificial material
- Patent number 11,011,523
- Issue date May 18, 2021
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure patterning
- Patent number 11,011,521
- Issue date May 18, 2021
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor recess formation
- Patent number 10,978,306
- Issue date Apr 13, 2021
- Micron Technology, Inc.
- Jerome A. Imonigie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a capacitor using a hard mask
- Patent number 10,978,553
- Issue date Apr 13, 2021
- Micron Technology, Inc.
- Diem Thy N. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a capacitor using a sacrificial layer
- Patent number 10,964,475
- Issue date Mar 30, 2021
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure formation
- Patent number 10,930,499
- Issue date Feb 23, 2021
- Micron Technology, Inc.
- Nicholas R. Tapias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using sacrificial polymer materials in semiconductor processing
- Patent number 10,916,418
- Issue date Feb 9, 2021
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Storage node shaping
- Patent number 10,811,419
- Issue date Oct 20, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure formation
- Patent number 10,777,561
- Issue date Sep 15, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor-etch cyclic process
- Patent number 10,607,851
- Issue date Mar 31, 2020
- Micron Technology, Inc.
- Andrew L. Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor assemblies having semiconductor material regions with...
- Patent number 10,546,923
- Issue date Jan 28, 2020
- Micron Technology, Inc.
- Pranav P. Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using sacrificial polymer materials in semiconductor processing
- Patent number 10,497,558
- Issue date Dec 3, 2019
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor assemblies having semiconductor material regions with...
- Patent number 10,374,033
- Issue date Aug 6, 2019
- Micron Technology, Inc.
- Pranav P. Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface modification compositions, methods of modifying silicon-bas...
- Patent number 9,653,307
- Issue date May 16, 2017
- Micron Technology, Inc.
- Jerome A. Imonigie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming air gaps in memory arrays and memory arrays with air gaps t...
- Patent number 9,397,210
- Issue date Jul 19, 2016
- Micron Technology, Inc.
- James Mathew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor and method of manufacturing the same
- Patent number 9,230,966
- Issue date Jan 5, 2016
- Nanya Technology Corp.
- Sanjeev Sapra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming bulb-shaped trenches in silicon
- Patent number 9,117,759
- Issue date Aug 25, 2015
- Micron Technology, Inc.
- Sanjeev Sapra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Capacitors
- Patent number 8,766,347
- Issue date Jul 1, 2014
- Micron Technology, Inc.
- Duane M. Goodner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structures and compositions for forming same
- Patent number 8,586,483
- Issue date Nov 19, 2013
- Micron Technology, Inc.
- Sanjeev Sapra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming air gaps in memory arrays and memory arrays with air gaps t...
- Patent number 8,569,130
- Issue date Oct 29, 2013
- Micron Technology, Inc.
- James Mathew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solutions for cleaning semiconductor structures and related methods
- Patent number 8,546,016
- Issue date Oct 1, 2013
- Micron Technology, Inc.
- Sanjeev Sapra
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Methods of removing a metal nitride material
- Patent number 8,283,259
- Issue date Oct 9, 2012
- Micron Technology, Inc.
- Sanjeev Sapra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming capacitors
- Patent number 8,283,236
- Issue date Oct 9, 2012
- Micron Technology, Inc.
- Duane M. Goodner
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONTACT FOOT WET PULLBACK WITH LINER WET PUNCH
- Publication number 20240389302
- Publication date Nov 21, 2024
- Micron Technology, Inc.
- Jerome A. Imonigie
Information Patent Application
WORDLINE RECESS FORMATION AND RESULTING STRUCTURES
- Publication number 20240341079
- Publication date Oct 10, 2024
- Micron Technology, Inc.
- Babak Tahmouresilerd
Information Patent Application
OVER-SCULPTED STORAGE NODE
- Publication number 20240088211
- Publication date Mar 14, 2024
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIGIT LINE AND CELL CONTACT ISOLATION
- Publication number 20230354585
- Publication date Nov 2, 2023
- Micron Technology, Inc.
- Albert P. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITORS WITH ELECTRODES HAVING A PORTION OF MATERIAL REMOVED, AN...
- Publication number 20220238532
- Publication date Jul 28, 2022
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
- Publication number 20210159069
- Publication date May 27, 2021
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SEMICONDUCTOR STRUCTURE FORMATION
- Publication number 20210143011
- Publication date May 13, 2021
- Micron Technology, Inc.
- Nicholas R. Tapias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE FORMATION
- Publication number 20210066307
- Publication date Mar 4, 2021
- Micron Technology, Inc.
- Vivek Yadav
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE FORMATION
- Publication number 20210057266
- Publication date Feb 25, 2021
- Micron Technology, Inc.
- Vivek Yadav
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE PATTERNING
- Publication number 20200381437
- Publication date Dec 3, 2020
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Selectively Removing More-Doped-Silicon-Dioxide relativ...
- Publication number 20200335351
- Publication date Oct 22, 2020
- Micron Technology, Inc.
- Jerome A. Imonigie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING
- Publication number 20200328076
- Publication date Oct 15, 2020
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE FORMATION
- Publication number 20200328080
- Publication date Oct 15, 2020
- Micron Technology, Inc.
- Nicholas R. Tapias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR RECESS FORMATION
- Publication number 20200312954
- Publication date Oct 1, 2020
- Micron Technology, Inc.
- Jerome A. Imonigie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE FORMATION
- Publication number 20200243528
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COLUMN FORMATION USING SACRIFICIAL MATERIAL
- Publication number 20200243536
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF A CAPACITOR USING A HARD MASK
- Publication number 20200243640
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Diem Thy N. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF A CAPACITOR USING A SACRIFICIAL LAYER
- Publication number 20200243258
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
- Publication number 20200075316
- Publication date Mar 5, 2020
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Semiconductor Assemblies Having Semiconductor Material Regions with...
- Publication number 20190312103
- Publication date Oct 10, 2019
- Micron Technology, Inc.
- Pranav P. Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING
- Publication number 20190267232
- Publication date Aug 29, 2019
- Micron Technology, Inc.
- Michael T. Andreas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
VAPOR-ETCH CYCLIC PROCESS
- Publication number 20190067028
- Publication date Feb 28, 2019
- Andrew L. Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITOR AND METHOD OF MANUFACTURING THE SAME
- Publication number 20160013191
- Publication date Jan 14, 2016
- Nanya Technology Corp.
- Sanjeev Sapra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES INCLUDING BULB-SHAPED TRENCHES
- Publication number 20150340320
- Publication date Nov 26, 2015
- Micron Technology, Inc.
- Sanjeev Sapra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITOR AND METHOD OF MANUFACTURING THE SAME
- Publication number 20150294971
- Publication date Oct 15, 2015
- NANYA TECHNOLOGY CORP.
- Sanjeev Sapra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING AIR GAPS IN MEMORY ARRAYS AND MEMORY ARRAYS WITH AIR GAPS T...
- Publication number 20140027832
- Publication date Jan 30, 2014
- Micron Technology, Inc.
- James Mathew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING TRENCHES IN SILICON AND A SEMICONDUCTOR DEVICE I...
- Publication number 20130037919
- Publication date Feb 14, 2013
- Micron Technology, Inc.
- Sanjeev Sapra
- B82 - NANO-TECHNOLOGY
Information Patent Application
FORMING AIR GAPS IN MEMORY ARRAYS AND MEMORY ARRAYS WITH AIR GAPS T...
- Publication number 20130026600
- Publication date Jan 31, 2013
- Micron Technology, Inc.
- James Matthew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURES AND COMPOSITIONS FOR FORMING SAME
- Publication number 20130009310
- Publication date Jan 10, 2013
- Micron Technology, Inc.
- Sanjeev Sapra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitors
- Publication number 20120326275
- Publication date Dec 27, 2012
- Micron Technology, Inc.
- Duane M. Goodner
- H01 - BASIC ELECTRIC ELEMENTS

Sanjeev Sapra

Person

Patents Grantslast 30 patents

Using sacrificial polymer materials in semiconductor processing

Semiconductor structure formation

Methods for selectively removing more-doped-silicon-dioxide relativ...

Semiconductor structure formation

Semiconductor processing applying supercritical drying

Semiconductor structure formation

Column formation using sacrificial material

Semiconductor structure patterning

Semiconductor recess formation

Formation of a capacitor using a hard mask

Formation of a capacitor using a sacrificial layer

Semiconductor structure formation

Using sacrificial polymer materials in semiconductor processing

Storage node shaping

Semiconductor structure formation

Vapor-etch cyclic process

Semiconductor assemblies having semiconductor material regions with...

Using sacrificial polymer materials in semiconductor processing

Semiconductor assemblies having semiconductor material regions with...

Surface modification compositions, methods of modifying silicon-bas...

Forming air gaps in memory arrays and memory arrays with air gaps t...

Capacitor and method of manufacturing the same

Methods of forming bulb-shaped trenches in silicon

Capacitors

Semiconductor device structures and compositions for forming same

Forming air gaps in memory arrays and memory arrays with air gaps t...

Solutions for cleaning semiconductor structures and related methods

Methods of removing a metal nitride material

Methods of forming capacitors

Patents Applicationslast 30 patents

CONTACT FOOT WET PULLBACK WITH LINER WET PUNCH

WORDLINE RECESS FORMATION AND RESULTING STRUCTURES

OVER-SCULPTED STORAGE NODE

DIGIT LINE AND CELL CONTACT ISOLATION

CAPACITORS WITH ELECTRODES HAVING A PORTION OF MATERIAL REMOVED, AN...

USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING

SEMICONDUCTOR STRUCTURE FORMATION

SEMICONDUCTOR STRUCTURE FORMATION

SEMICONDUCTOR STRUCTURE FORMATION

SEMICONDUCTOR STRUCTURE PATTERNING

Methods for Selectively Removing More-Doped-Silicon-Dioxide relativ...

SEMICONDUCTOR PROCESSING

SEMICONDUCTOR STRUCTURE FORMATION

SEMICONDUCTOR RECESS FORMATION

SEMICONDUCTOR STRUCTURE FORMATION

COLUMN FORMATION USING SACRIFICIAL MATERIAL

FORMATION OF A CAPACITOR USING A HARD MASK

FORMATION OF A CAPACITOR USING A SACRIFICIAL LAYER

USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING

Semiconductor Assemblies Having Semiconductor Material Regions with...

USING SACRIFICIAL POLYMER MATERIALS IN SEMICONDUCTOR PROCESSING

VAPOR-ETCH CYCLIC PROCESS

CAPACITOR AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICES INCLUDING BULB-SHAPED TRENCHES

CAPACITOR AND METHOD OF MANUFACTURING THE SAME

FORMING AIR GAPS IN MEMORY ARRAYS AND MEMORY ARRAYS WITH AIR GAPS T...

METHODS OF FORMING TRENCHES IN SILICON AND A SEMICONDUCTOR DEVICE I...

FORMING AIR GAPS IN MEMORY ARRAYS AND MEMORY ARRAYS WITH AIR GAPS T...

SEMICONDUCTOR DEVICE STRUCTURES AND COMPOSITIONS FOR FORMING SAME

Capacitors