Sarah N. McGowan

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optimized optical proximity correction handling for lithographic fills
- Patent number 8,881,068
- Issue date Nov 4, 2014
- GLOBALFOUNDRIES Inc.
- Pavan Bashaboina
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of modifying a physical design of an electrical circuit use...
- Patent number 8,739,077
- Issue date May 27, 2014
- GLOBALFOUNDRIES, INC.
- Piyush Pathak
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of lithographic image alignment for use with a dual mask exp...
- Patent number 7,108,946
- Issue date Sep 19, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Predefined critical spaces in IC patterning to reduce line end pull...
- Patent number 7,071,085
- Issue date Jul 4, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for determining an illumination intensity profile...
- Patent number 7,027,130
- Issue date Apr 11, 2006
- Advanced Micro Devices, Inc.
- Christopher A. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduce line end pull back by exposing and etching space after mask...
- Patent number 7,015,148
- Issue date Mar 21, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microdevice having non-linear structural component and method of fa...
- Patent number 6,995,433
- Issue date Feb 7, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OPTIMIZED OPTICAL PROXIMITY CORRECTION HANDLING FOR LITHOGRAPHIC FILLS
- Publication number 20140223392
- Publication date Aug 7, 2014
- GLOBALFOUNDRIES INC.
- Pavan Bashaboina
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method for determining an illumination intensity profile...
- Publication number 20050243299
- Publication date Nov 3, 2005
- Christopher A. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sarah N. McGowan

Person

Patents Grantslast 30 patents

Optimized optical proximity correction handling for lithographic fills

Methods of modifying a physical design of an electrical circuit use...

Method of lithographic image alignment for use with a dual mask exp...

Predefined critical spaces in IC patterning to reduce line end pull...

Device and method for determining an illumination intensity profile...

Reduce line end pull back by exposing and etching space after mask...

Microdevice having non-linear structural component and method of fa...

Patents Applicationslast 30 patents

OPTIMIZED OPTICAL PROXIMITY CORRECTION HANDLING FOR LITHOGRAPHIC FILLS

Device and method for determining an illumination intensity profile...