Sarathi ROY

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Computational metrology based sampling scheme
- Patent number 12,044,979
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining a correction to a process
- Patent number 11,994,845
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computational metrology based sampling scheme
- Patent number 11,635,698
- Issue date Apr 25, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing an apparatus for multi-stage processing of product units
- Patent number 11,520,238
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Jelle Nije
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology based correction and control
- Patent number 11,448,973
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Manouk Rijpstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods using fingerprint and evolution analysis
- Patent number 11,281,110
- Issue date Mar 22, 2022
- ASML Netherlands B.V.
- Jeroen Van Dongen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for deriving corrections, method and apparatus...
- Patent number 11,243,470
- Issue date Feb 8, 2022
- ASML Netherlands B.V.
- Nitish Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing an apparatus for multi-stage processing of product units
- Patent number 11,150,562
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Jelle Nije
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for detecting substrate surface variations
- Patent number 11,092,902
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Johannes Franciscus Martinus D'Achard Van Enschut
- G01 - MEASURING TESTING
Information Patent Grant
Determining a correction to a process
- Patent number 11,086,305
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME
- Publication number 20240377756
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20240345569
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CAUSAL CONVOLUTION NETWORK FOR PROCESS CONTROL
- Publication number 20240184254
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20230259042
- Publication date Aug 17, 2023
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME
- Publication number 20230221654
- Publication date Jul 13, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR OPTIMIZING A SAMPLING SCHEME AND ASSOCIATED APPARATUSES
- Publication number 20230176490
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
- Publication number 20220365446
- Publication date Nov 17, 2022
- ASML NETHERLANDS B.V.
- Manouk RIJPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE
- Publication number 20220334503
- Publication date Oct 20, 2022
- ASML NETHERLANDS B.V.
- Yingchao CUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS
- Publication number 20220091514
- Publication date Mar 24, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G05 - CONTROLLING REGULATING
Information Patent Application
OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS
- Publication number 20220004108
- Publication date Jan 6, 2022
- ASML NETHERLANDS B.V.
- Jelle NIJE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20210333785
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS USING FINGERPRINT AND EVOLUTION ANALYSIS
- Publication number 20210255547
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Jeroen Van Dongen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20210165399
- Publication date Jun 3, 2021
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
- Publication number 20210080837
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Manouk RIJPSTRA
- G05 - CONTROLLING REGULATING
Information Patent Application
COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME
- Publication number 20200371441
- Publication date Nov 26, 2020
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS
- Publication number 20200233315
- Publication date Jul 23, 2020
- ASML NETHERLANDS B.V.
- Jelle NIJE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Detecting Substrate Surface Variations
- Publication number 20200124977
- Publication date Apr 23, 2020
- ASML Netherlands B.V.
- Johannes Franciscus Martinus D'ACHARD VAN ENSCHUT
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DERIVING CORRECTIONS, METHOD AND APPARATUS...
- Publication number 20190212660
- Publication date Jul 11, 2019
- ASML NETHERLANDS B.V.
- Nitish KUMAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sarathi ROY

Person

Patents Grantslast 30 patents

Computational metrology based sampling scheme

Determining a correction to a process

Computational metrology based sampling scheme

Optimizing an apparatus for multi-stage processing of product units

Computational metrology based correction and control

Methods using fingerprint and evolution analysis

Method and apparatus for deriving corrections, method and apparatus...

Optimizing an apparatus for multi-stage processing of product units

Method and apparatus for detecting substrate surface variations

Determining a correction to a process

Patents Applicationslast 30 patents

COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME

DETERMINING A CORRECTION TO A PROCESS

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

CAUSAL CONVOLUTION NETWORK FOR PROCESS CONTROL

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME

METHOD FOR OPTIMIZING A SAMPLING SCHEME AND ASSOCIATED APPARATUSES

COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE

METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS

OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS

DETERMINING A CORRECTION TO A PROCESS

METHODS USING FINGERPRINT AND EVOLUTION ANALYSIS

DETERMINING A CORRECTION TO A PROCESS

COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME

OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS

Method and Apparatus for Detecting Substrate Surface Variations

METHOD AND APPARATUS FOR DERIVING CORRECTIONS, METHOD AND APPARATUS...