Sascha Bleidistel

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,908,508
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,578,976
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,509,325
- Issue date Dec 17, 2019
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for transmitting electrical signals, and lithography apparatus
- Patent number 10,459,351
- Issue date Oct 29, 2019
- Carl Zeiss SMT GmbH
- Jan Horn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for actuating an element in a microlithographic project...
- Patent number 10,185,221
- Issue date Jan 22, 2019
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus comprising a measuring system for mea...
- Patent number 10,162,270
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus including mechanism to reduce influen...
- Patent number 10,162,267
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,146,137
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 10,054,786
- Issue date Aug 21, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimum arrangement of actuator and sensor points on an optical ele...
- Patent number 10,025,200
- Issue date Jul 17, 2018
- Carl Zeiss SMT GmbH
- Pascal Marsollek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with wavefront measuring device and o...
- Patent number 10,012,911
- Issue date Jul 3, 2018
- Carl Zeiss SMT GmbH
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with aperture device having plurality of aperture el...
- Patent number 9,964,673
- Issue date May 8, 2018
- Carl Zeiss SMT GmbH
- Benjamin Sigel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for actuating an element in a microlithographic project...
- Patent number 9,841,682
- Issue date Dec 12, 2017
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device and method for reducing dynamic fluctuations...
- Patent number 9,817,322
- Issue date Nov 14, 2017
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 9,581,813
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for actuating an element in a microlithographic project...
- Patent number 9,568,837
- Issue date Feb 14, 2017
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,535,336
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor microlithography projection exposure apparatus
- Patent number 9,366,977
- Issue date Jun 14, 2016
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 9,366,857
- Issue date Jun 14, 2016
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 9,164,396
- Issue date Oct 20, 2015
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with multiple sets of piezoelectric e...
- Patent number 9,110,388
- Issue date Aug 18, 2015
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 9,069,263
- Issue date Jun 30, 2015
- Carl Zeiss SMT GmbH
- Olaf Conradi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 8,811,568
- Issue date Aug 19, 2014
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Arrangement for actuating an element in a microlithographic project...
- Patent number 8,786,826
- Issue date Jul 22, 2014
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus with correction opt...
- Patent number 8,773,638
- Issue date Jul 8, 2014
- Carl Zeiss SMT GmbH
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,767,176
- Issue date Jul 1, 2014
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 8,760,744
- Issue date Jun 24, 2014
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 8,614,843
- Issue date Dec 24, 2013
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 8,319,944
- Issue date Nov 27, 2012
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and optical system
- Patent number 8,269,948
- Issue date Sep 18, 2012
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL DEVICE, METHOD FOR ADJUSTING A SETPOINT DEFORMATION AND LIT...
- Publication number 20240085783
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Markus Raab
- G02 - OPTICS
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20210149309
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20200089126
- Publication date Mar 19, 2020
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR TRANSMITTING ELECTRICAL SIGNALS, AND LITHOGRAPHY APPARATUS
- Publication number 20190196343
- Publication date Jun 27, 2019
- Carl Zeiss SMT GMBH
- Jan Horn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20190101832
- Publication date Apr 4, 2019
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20190086813
- Publication date Mar 21, 2019
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G02 - OPTICS
Information Patent Application
ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...
- Publication number 20180181005
- Publication date Jun 28, 2018
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH WAVEFRONT MEASURING DEVICE AND O...
- Publication number 20170336714
- Publication date Nov 23, 2017
- Carl Zeiss SMT GMBH
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...
- Publication number 20170153553
- Publication date Jun 1, 2017
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
OPTIMUM ARRANGEMENT OF ACTUATOR AND SENSOR POINTS ON AN OPTICAL ELE...
- Publication number 20170068165
- Publication date Mar 9, 2017
- Carl Zeiss SMT GMBH
- Pascal Marsollek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...
- Publication number 20160259161
- Publication date Sep 8, 2016
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...
- Publication number 20160054661
- Publication date Feb 25, 2016
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS INCLUDING MECHANISM TO REDUCE INFLUEN...
- Publication number 20150316854
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...
- Publication number 20150293352
- Publication date Oct 15, 2015
- Carl Zeiss SMT GMBH
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...
- Publication number 20150062682
- Publication date Mar 5, 2015
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
Projection Exposure Apparatus Comprising a Measuring System for Mea...
- Publication number 20140340664
- Publication date Nov 20, 2014
- Sascha Bleidistel
- G01 - MEASURING TESTING
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140333912
- Publication date Nov 13, 2014
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...
- Publication number 20140300882
- Publication date Oct 9, 2014
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...
- Publication number 20140204356
- Publication date Jul 24, 2014
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...
- Publication number 20140078567
- Publication date Mar 20, 2014
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
Projection Exposure Tool for Microlithography and Method for Microl...
- Publication number 20130182264
- Publication date Jul 18, 2013
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...
- Publication number 20130070224
- Publication date Mar 21, 2013
- Carl Zeiss SMT GMBH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM
- Publication number 20120320353
- Publication date Dec 20, 2012
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20120218536
- Publication date Aug 30, 2012
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
- Publication number 20120069310
- Publication date Mar 22, 2012
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS...
- Publication number 20120026479
- Publication date Feb 2, 2012
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM WITH APERTURE DEVICE
- Publication number 20110194089
- Publication date Aug 11, 2011
- Carl Zeiss SMT GMBH
- Benjamin Sigel
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20110181852
- Publication date Jul 28, 2011
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110019169
- Publication date Jan 27, 2011
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...
- Publication number 20100290024
- Publication date Nov 18, 2010
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS

Sascha Bleidistel

Person

Patents Grantslast 30 patents

Position measurement of optical elements in a lithographic apparatus

Catadioptric projection objective including a reflective optical co...

Position measurement of optical elements in a lithographic apparatus

Device for transmitting electrical signals, and lithography apparatus

Arrangement for actuating an element in a microlithographic project...

Projection exposure apparatus comprising a measuring system for mea...

Projection exposure apparatus including mechanism to reduce influen...

Catadioptric projection objective including a reflective optical co...

Correction of optical elements by correction light irradiated in a...

Optimum arrangement of actuator and sensor points on an optical ele...

Projection exposure apparatus with wavefront measuring device and o...

Optical system with aperture device having plurality of aperture el...

Arrangement for actuating an element in a microlithographic project...

Optical imaging device and method for reducing dynamic fluctuations...

Method for improving the imaging properties of a projection objecti...

Arrangement for actuating an element in a microlithographic project...

Microlithographic projection exposure apparatus

Semiconductor microlithography projection exposure apparatus

Correction of optical elements by correction light irradiated in a...

Projection lens system of a microlithographic projection exposure i...

Projection exposure apparatus with multiple sets of piezoelectric e...

Method for improving the imaging properties of a projection objecti...

Correction of optical elements by correction light irradiated in a...

Arrangement for actuating an element in a microlithographic project...

Microlithographic projection exposure apparatus with correction opt...

Microlithographic projection exposure apparatus

Correction of optical elements by correction light irradiated in a...

Correction of optical elements by correction light irradiated in a...

Projection lens system of a microlithographic projection exposure i...

Projection exposure apparatus and optical system

Patents Applicationslast 30 patents

OPTICAL DEVICE, METHOD FOR ADJUSTING A SETPOINT DEFORMATION AND LIT...

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

DEVICE FOR TRANSMITTING ELECTRICAL SIGNALS, AND LITHOGRAPHY APPARATUS

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...

PROJECTION EXPOSURE APPARATUS WITH WAVEFRONT MEASURING DEVICE AND O...

ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...

OPTIMUM ARRANGEMENT OF ACTUATOR AND SENSOR POINTS ON AN OPTICAL ELE...

CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...

ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...

PROJECTION EXPOSURE APPARATUS INCLUDING MECHANISM TO REDUCE INFLUEN...

METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...

CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...

Projection Exposure Apparatus Comprising a Measuring System for Mea...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...

ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECT...

CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...

Projection Exposure Tool for Microlithography and Method for Microl...

PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...

PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

SEMICONDUCTOR MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS...

OPTICAL SYSTEM WITH APERTURE DEVICE

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...