Satohiko Hoshino

Person

Yamanashi-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for aligning chip components relative to substrate by using...
- Patent number 10,553,455
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Shinya Kikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprinting method
- Patent number 9,370,875
- Issue date Jun 21, 2016
- Tokyo Electron Limited
- Satohiko Hoshino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate wiring method and semiconductor manufacturing device
- Patent number 8,940,638
- Issue date Jan 27, 2015
- Tokyo Electron Limited
- Satohiko Hoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication of low dielectric constant insulating film
- Patent number 7,645,481
- Issue date Jan 12, 2010
- Tokyo Electron Limited
- Masaru Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming insulating layer
- Patent number 7,569,497
- Issue date Aug 4, 2009
- Tokyo Electron Limited
- Toshiaki Hongoh
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of manufacturing trench structure for device
- Patent number 7,176,142
- Issue date Feb 13, 2007
- Tokyo Electron Limited
- Nobutaka Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication process of a semiconductor device
- Patent number 6,890,848
- Issue date May 10, 2005
- Tokyo Electron Limited
- Kaoru Maekawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ALIGNING CHIP COMPONENTS RELATIVE TO SUBSTRATE BY USING...
- Publication number 20190096697
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Shinya KIKUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20130056024
- Publication date Mar 7, 2013
- IWATANI CORPORATION
- Satohiko Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WIRING METHOD AND SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20130040459
- Publication date Feb 14, 2013
- IWATANI CORPORATION
- Satohiko Hoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPRINTING METHOD
- Publication number 20120306122
- Publication date Dec 6, 2012
- TOKYO ELECTRON LIMITED
- Satohiko HOSHINO
- B82 - NANO-TECHNOLOGY
Information Patent Application
Vacuum Processing Apparatus, Vacuum Processing Method, and Micro-Ma...
- Publication number 20120071003
- Publication date Mar 22, 2012
- Kazuya Dobashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
QUANTUM DOT FORMING METHOD, STORAGE MEDIUM STORING A PROGRAM AND SU...
- Publication number 20120052658
- Publication date Mar 1, 2012
- TOKYO ELECTRON LIMITED
- Song Yun KANG
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
FABRICATION OF LOW DIELECTRIC CONSTANT INSULATING FILM
- Publication number 20100132613
- Publication date Jun 3, 2010
- TOKYO ELECTRON LIMITED
- Masaru SASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing trench structure for device
- Publication number 20070148985
- Publication date Jun 28, 2007
- Nobutaka Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication of low dielectric constant insulating film
- Publication number 20070098890
- Publication date May 3, 2007
- Masaru Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Forming method of low dielectric constant insulating film of semico...
- Publication number 20060154492
- Publication date Jul 13, 2006
- TOKYO ELECTRON LIMITED
- Shinji Ide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing method and semiconductor manufacturing...
- Publication number 20050153533
- Publication date Jul 14, 2005
- TOKYO ELECTRON LIMITED
- Satohiko Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for forming insulating layer
- Publication number 20050148167
- Publication date Jul 7, 2005
- TOKYO ELECTRON LIMITED
- Toshiaki Hongoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing trench structure for device
- Publication number 20040002214
- Publication date Jan 1, 2004
- Nobutaka Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication process of a semiconductor device
- Publication number 20020164869
- Publication date Nov 7, 2002
- Kaoru Maekawa
- H01 - BASIC ELECTRIC ELEMENTS

Satohiko Hoshino

Person

Patents Grantslast 30 patents

Method for aligning chip components relative to substrate by using...

Imprinting method

Substrate wiring method and semiconductor manufacturing device

Fabrication of low dielectric constant insulating film

Method and apparatus for forming insulating layer

Method of manufacturing trench structure for device

Fabrication process of a semiconductor device

Patents Applicationslast 30 patents

METHOD FOR ALIGNING CHIP COMPONENTS RELATIVE TO SUBSTRATE BY USING...

SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE WIRING METHOD AND SEMICONDUCTOR MANUFACTURING DEVICE

IMPRINTING METHOD

Vacuum Processing Apparatus, Vacuum Processing Method, and Micro-Ma...

QUANTUM DOT FORMING METHOD, STORAGE MEDIUM STORING A PROGRAM AND SU...

FABRICATION OF LOW DIELECTRIC CONSTANT INSULATING FILM

Method of manufacturing trench structure for device

Fabrication of low dielectric constant insulating film

Forming method of low dielectric constant insulating film of semico...

Semiconductor manufacturing method and semiconductor manufacturing...

Method and apparatus for forming insulating layer

Method of manufacturing trench structure for device

Fabrication process of a semiconductor device