Satomi INOUE

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing system
- Patent number 12,014,909
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Communication system and communication method
- Patent number 11,979,255
- Issue date May 7, 2024
- Nippon Telegraph and Telephone Corporation
- Takeaki Nishioka
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Control device and control method
- Patent number 11,954,512
- Issue date Apr 9, 2024
- Nippon Telegraph and Telephone Corporation
- Satomi Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus, data processing apparatus and data pro...
- Patent number 11,605,530
- Issue date Mar 14, 2023
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operational method thereof
- Patent number 11,424,110
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and analysis method for analyzing plasm...
- Patent number 11,404,253
- Issue date Aug 2, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,355,324
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Communication system and communication method
- Patent number 11,323,385
- Issue date May 3, 2022
- Nippon Telegraph and Telephone Corporation
- Satomi Inoue
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 11,308,182
- Issue date Apr 19, 2022
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Control device and control method
- Patent number 11,212,206
- Issue date Dec 28, 2021
- Nippon Telegraph and Telephone Corporation
- Masayuki Nishiki
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Plasma processing apparatus and plasma processing system
- Patent number 10,872,750
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,872,774
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Hao Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 10,783,220
- Issue date Sep 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and analysis method for analyzing plasm...
- Patent number 10,734,207
- Issue date Aug 4, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operation method thereof
- Patent number 10,672,595
- Issue date Jun 2, 2020
- HITACHI HIGH-TECH CORPORATION
- Takeshi Ohmori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, data processing apparatus and data pro...
- Patent number 10,615,010
- Issue date Apr 7, 2020
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,453,695
- Issue date Oct 22, 2019
- Hitachi High-Technologies Corporation
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and plasma pr...
- Patent number 10,408,762
- Issue date Sep 10, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,262,840
- Issue date Apr 16, 2019
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,153,217
- Issue date Dec 11, 2018
- Hitachi High-Technologies Corporation
- Daisuke Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 10,073,818
- Issue date Sep 11, 2018
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,020,233
- Issue date Jul 10, 2018
- Hitachi High-Technologies Corporation
- Shigeru Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operation method thereof
- Patent number 10,008,370
- Issue date Jun 26, 2018
- Hitachi High-Technologies Corporation
- Takeshi Ohmori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operating method of plasma processi...
- Patent number 9,934,946
- Issue date Apr 3, 2018
- Hitachi High-Technologies Corporation
- Yohei Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,865,439
- Issue date Jan 9, 2018
- Hitachi High-Technologies Corporation
- Shigeru Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,805,940
- Issue date Oct 31, 2017
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operational method thereof
- Patent number 9,767,997
- Issue date Sep 19, 2017
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,741,629
- Issue date Aug 22, 2017
- Hitachi High-Technologies Corporation
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber allocation setting device and processing chamber...
- Patent number 9,507,328
- Issue date Nov 29, 2016
- Hitachi High-Technologies Corporation
- Teruo Nakata
- G05 - CONTROLLING REGULATING
Information Patent Grant
Operation method for vacuum processing apparatus
- Patent number 9,257,318
- Issue date Feb 9, 2016
- Hitachi High-Technologies Corporation
- Michinori Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ANALYSIS DEVICE, ANALYSIS METHOD, AND ANALYSIS PROGRAM
- Publication number 20250016079
- Publication date Jan 9, 2025
- Nippon Telegraph and Telephone Corporation
- Shohei KAMAMURA
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20220262606
- Publication date Aug 18, 2022
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMMUNICATION SYSTEM AND COMMUNICATION METHOD
- Publication number 20220131722
- Publication date Apr 28, 2022
- Nippon Telegraph and Telephone Corporation
- Takeaki NISHIOKA
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
CONTROL DEVICE AND CONTROL METHOD
- Publication number 20210336865
- Publication date Oct 28, 2021
- Nippon Telegraph and Telephone Corporation
- Masayuki Nishiki
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
CONTROL DEVICE AND CONTROL METHOD
- Publication number 20210303332
- Publication date Sep 30, 2021
- Nippon Telegraph and Telephone Corporation
- Satomi Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20210074528
- Publication date Mar 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMMUNICATION SYSTEM AND COMMUNICATION METHOD
- Publication number 20200382439
- Publication date Dec 3, 2020
- Nippon Telegraph and Telephone Corporation
- Satomi Inoue
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20200380066
- Publication date Dec 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...
- Publication number 20200328067
- Publication date Oct 15, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200294777
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Kosa HIROTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...
- Publication number 20200203133
- Publication date Jun 25, 2020
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200035445
- Publication date Jan 30, 2020
- Hitachi High-Technologies Corporation
- Hao XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20190170653
- Publication date Jun 6, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20190051502
- Publication date Feb 14, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20180341625
- Publication date Nov 29, 2018
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180277377
- Publication date Sep 27, 2018
- Hitachi High-Technologies Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF
- Publication number 20180269042
- Publication date Sep 20, 2018
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180068909
- Publication date Mar 8, 2018
- Hitachi High-Technologies Corporation
- Daisuke SHIRAISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...
- Publication number 20180025894
- Publication date Jan 25, 2018
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF
- Publication number 20170372878
- Publication date Dec 28, 2017
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170358504
- Publication date Dec 14, 2017
- Hitachi High-Technologies Corporation
- Tatehito USUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATING METHOD OF PLASMA PROCESSI...
- Publication number 20170178874
- Publication date Jun 22, 2017
- Hitachi High-Technologies Corporation
- Yohei KAWAGUCHI
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160351405
- Publication date Dec 1, 2016
- Hitachi High-Technologies Corporation
- Kousuke FUKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...
- Publication number 20160336154
- Publication date Nov 17, 2016
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160284610
- Publication date Sep 29, 2016
- Hitachi High-Technologies Corporation
- Tatehito USUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20160225681
- Publication date Aug 4, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160211186
- Publication date Jul 21, 2016
- Hitachi High-Technologies Corporation
- Shigeru NAKAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF
- Publication number 20160177449
- Publication date Jun 23, 2016
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20150154145
- Publication date Jun 4, 2015
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150041060
- Publication date Feb 12, 2015
- Hitachi High-Technologies Corporation
- Kousa Hirota
- H01 - BASIC ELECTRIC ELEMENTS

Satomi INOUE

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing system

Communication system and communication method

Control device and control method

Plasma processing apparatus, data processing apparatus and data pro...

Plasma processing apparatus and operational method thereof

Plasma processing apparatus and analysis method for analyzing plasm...

Plasma processing method

Communication system and communication method

Data processing method, data processing apparatus and processing ap...

Control device and control method

Plasma processing apparatus and plasma processing system

Plasma processing apparatus and plasma processing method

Data processing method, data processing apparatus and processing ap...

Plasma processing apparatus and analysis method for analyzing plasm...

Plasma processing apparatus and operation method thereof

Plasma processing apparatus, data processing apparatus and data pro...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus, plasma processing method and plasma pr...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Data processing method, data processing apparatus and processing ap...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and operation method thereof

Plasma processing apparatus and operating method of plasma processi...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and operational method thereof

Plasma processing apparatus and plasma processing method

Processing chamber allocation setting device and processing chamber...

Operation method for vacuum processing apparatus

Patents Applicationslast 30 patents

ANALYSIS DEVICE, ANALYSIS METHOD, AND ANALYSIS PROGRAM

PLASMA PROCESSING METHOD

COMMUNICATION SYSTEM AND COMMUNICATION METHOD

CONTROL DEVICE AND CONTROL METHOD

CONTROL DEVICE AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM

COMMUNICATION SYSTEM AND COMMUNICATION METHOD

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...

PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND OPERATING METHOD OF PLASMA PROCESSI...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS