Satoru Funato

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Development defect preventing process and material
- Patent number 7,195,863
- Issue date Mar 27, 2007
- AZ Electronic Materials USA Corp.
- Yusuke Takano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern and treating agent for use therein
- Patent number 7,018,785
- Issue date Mar 28, 2006
- AZ Electronic Materials USA Corp.
- Kazuyo Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing resists
- Patent number 6,686,121
- Issue date Feb 3, 2004
- Clariant Finance (BVI) Limited
- Hiroshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method
- Patent number 6,527,966
- Issue date Mar 4, 2003
- Clariant Finance (BVI) Limited
- Koji Shimomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemically amplified resist composition
- Patent number 6,479,210
- Issue date Nov 12, 2002
- Clariant Finance (BVI) Limited
- Yoshiaki Kinoshita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for preparing resists
- Patent number 6,284,427
- Issue date Sep 4, 2001
- Clariant Finance (BVI) Limited
- Hiroshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition and recording medium using the same
- Patent number 6,110,639
- Issue date Aug 29, 2000
- Hoechst Japan Limited
- Seiya Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid-labile group protected hydroxystyrene polymers or copolymers t...
- Patent number 5,852,128
- Issue date Dec 22, 1998
- Clariant AG
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition containing plasticizer
- Patent number 5,846,690
- Issue date Dec 8, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 5,773,191
- Issue date Jun 30, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,738,972
- Issue date Apr 14, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for forming pattern and treating agent for use therein
- Publication number 20040053170
- Publication date Mar 18, 2004
- Kazuyo Ijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Development deffect preventing process and material
- Publication number 20030180667
- Publication date Sep 25, 2003
- Yusuke Takano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20010036589
- Publication date Nov 1, 2001
- YOSHIAKI KINOSHITA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel process for preparing resists
- Publication number 20010024765
- Publication date Sep 27, 2001
- Hiroshi Okazaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Satoru Funato

Person

Patents Grantslast 30 patents

Development defect preventing process and material

Method for forming pattern and treating agent for use therein

Process for preparing resists

Pattern forming method

Chemically amplified resist composition

Process for preparing resists

Radiation-sensitive composition and recording medium using the same

Acid-labile group protected hydroxystyrene polymers or copolymers t...

Radiation-sensitive composition containing plasticizer

Radiation-sensitive composition

Radiation sensitive composition

Patents Applicationslast 30 patents

Method for forming pattern and treating agent for use therein

Development deffect preventing process and material

CHEMICALLY AMPLIFIED RESIST COMPOSITION

Novel process for preparing resists