Satoru Kawakami

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus
- Patent number 12,148,637
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Kiyoshi Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shower plate, plasma processing apparatus and plasma processing method
- Patent number 12,051,564
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate, lower dielectric member and plasma processing apparatus
- Patent number 12,046,455
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device, and plasma processing method
- Patent number 12,020,900
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Munehito Kagaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and lower stage
- Patent number 11,929,234
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,170
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and plasma processing method
- Patent number 11,538,667
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,570,512
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Toshihiko Iwao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma processing apparatus and microwave supplying method
- Patent number 9,633,821
- Issue date Apr 25, 2017
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus and microwave supplying method
- Patent number 9,305,751
- Issue date Apr 5, 2016
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 8,522,958
- Issue date Sep 3, 2013
- Tokyo Electron Limited
- Yasuhiro Tobe
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Substrate processing apparatus
- Patent number 8,337,621
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Yasuhiro Tobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus having dielectric plates linked together by el...
- Patent number 6,558,508
- Issue date May 6, 2003
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma deposition apparatus and method with controller
- Patent number 6,501,082
- Issue date Dec 31, 2002
- Tokyo Electron Limited
- Toshio Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 6,470,824
- Issue date Oct 29, 2002
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring negative ion density of plasma and plasma proce...
- Patent number 6,452,400
- Issue date Sep 17, 2002
- Tokyo Electron Limited
- Yoshinobu Kawai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 6,431,114
- Issue date Aug 13, 2002
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,432,208
- Issue date Aug 13, 2002
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing method and semiconductor manufacturing...
- Patent number 6,399,520
- Issue date Jun 4, 2002
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus having a vacuum pump located...
- Patent number 6,358,324
- Issue date Mar 19, 2002
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device and a method of plasma process
- Patent number 6,284,674
- Issue date Sep 4, 2001
- Tokyo Electron Limited
- Makoto Toraguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device and a method of plasma process
- Patent number 6,161,498
- Issue date Dec 19, 2000
- Tokyo Electron Limited
- Makoto Toraguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment method and system
- Patent number 6,066,568
- Issue date May 23, 2000
- Tokyo Electron Limited
- Yoshinobu Kawai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,665,166
- Issue date Sep 9, 1997
- Tokyo Electron Limited
- Youichi Deguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus having a workpiece-side electrode ground...
- Patent number 5,665,167
- Issue date Sep 9, 1997
- Tokyo Electron Kabushiki Kaisha
- Yoichi Deguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus
- Patent number 5,542,559
- Issue date Aug 6, 1996
- Tokyo Electron Kabushiki Kaisha
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process system and method
- Patent number 5,494,522
- Issue date Feb 27, 1996
- Tokyo Electron Limited
- Shuji Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus
- Patent number 5,478,429
- Issue date Dec 26, 1995
- Tokyo Electron Limited
- Mitsuaki Komino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Apparatus and Plasma Control Method
- Publication number 20240339304
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240331977
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20240203692
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ASSEMBLY METHOD OF RESONATOR ARRAY...
- Publication number 20240186114
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240186115
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240186113
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240038500
- Publication date Feb 1, 2024
- Tokyo Electron Limited
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386791
- Publication date Nov 30, 2023
- Tokyo Electron Limited
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230295797
- Publication date Sep 21, 2023
- Tokyo Electron Limited
- Nobuo MATSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230245870
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230238219
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20230223239
- Publication date Jul 13, 2023
- Satoru KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD
- Publication number 20230215754
- Publication date Jul 6, 2023
- Tokyo Electron Limited
- Satoru KAWAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...
- Publication number 20230054452
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230033323
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230031447
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230005720
- Publication date Jan 5, 2023
- Tokyo Electron Limited
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220230896
- Publication date Jul 21, 2022
- TOKYO ELECTRON LIMITED
- Kiyoshi MORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20220165544
- Publication date May 26, 2022
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND LOWER STAGE
- Publication number 20220068603
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220037118
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Satoru KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER PLATE, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220037117
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210407766
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210384009
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Satoru KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210375588
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD
- Publication number 20210265138
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD
- Publication number 20210074518
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Satoru KAWAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWER PLATE, LOWER DIELECTRIC MEMBER AND PLASMA PROCESSING APPARATUS
- Publication number 20210043426
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200294775
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Satoru KAWAKAMI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESSING SYSTEM
- Publication number 20180130681
- Publication date May 10, 2018
- TOKYO ELECTRON LIMITED
- Tamotsu Tanifuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Satoru Kawakami

Person

Patents Grantslast 30 patents

Substrate processing apparatus

Shower plate, plasma processing apparatus and plasma processing method

Shower plate, lower dielectric member and plasma processing apparatus

Plasma processing device, and plasma processing method

Plasma processing apparatus and lower stage

Plasma processing apparatus and plasma processing method

Stage, plasma processing apparatus, and plasma processing method

Substrate processing apparatus

Microwave plasma processing apparatus and microwave supplying method

Microwave plasma processing apparatus and microwave supplying method

Vacuum processing apparatus

Substrate processing apparatus

Processing apparatus having dielectric plates linked together by el...

Plasma deposition apparatus and method with controller

Semiconductor manufacturing apparatus

Method of measuring negative ion density of plasma and plasma proce...

Method and apparatus for plasma processing

Plasma processing apparatus

Semiconductor manufacturing method and semiconductor manufacturing...

Microwave plasma processing apparatus having a vacuum pump located...

Plasma processing device and a method of plasma process

Plasma processing device and a method of plasma process

Plasma treatment method and system

Plasma processing apparatus

Plasma treatment apparatus having a workpiece-side electrode ground...

Plasma treatment apparatus

Plasma process system and method

Plasma process apparatus

Patents Applicationslast 30 patents

Plasma Processing Apparatus and Plasma Control Method

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

PLASMA PROCESSING APPARATUS AND ASSEMBLY METHOD OF RESONATOR ARRAY...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD

SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND LOWER STAGE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SHOWER PLATE, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

STAGE, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD

SHOWER PLATE, LOWER DIELECTRIC MEMBER AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PROCESSING SYSTEM