Satoru Mihara

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,913,970
- Issue date Jul 5, 2005
- Fujitsu Limited
- Kenichi Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing a strontium ruthenium oxide protective layer...
- Patent number 6,674,633
- Issue date Jan 6, 2004
- Fujitsu Limited
- Shan Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,509,593
- Issue date Jan 21, 2003
- Fujitsu Limited
- Kenichi Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering film forming method, sputtering film forming equipment,...
- Patent number 6,287,986
- Issue date Sep 11, 2001
- Fujitsu Limited
- Satoru Mihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method including plasma etching...
- Patent number 6,071,828
- Issue date Jun 6, 2000
- Fujitsu Limited
- Satoru Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method including ashing process
- Patent number 6,044,850
- Issue date Apr 4, 2000
- Fujitsu Limited
- Soichiro Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device with patterned laminat...
- Patent number 6,020,111
- Issue date Feb 1, 2000
- Fujitsu Limited
- Satoru Mihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for plasma downstream processing
- Patent number 5,750,208
- Issue date May 12, 1998
- Fujitsu Limited
- Satoru Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacture of semiconductor device with ashing and etching
- Patent number 5,681,780
- Issue date Oct 28, 1997
- Fujitsu Limited
- Satoru Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma downstream processing
- Patent number 5,562,775
- Issue date Oct 8, 1996
- Fujitsu Limited
- Satoru Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ashing method with oxygen pretreatment
- Patent number 5,560,803
- Issue date Oct 1, 1996
- Fujitsu Limited
- Satoru Mihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming resist mask pattern
- Patent number 5,447,598
- Issue date Sep 5, 1995
- Fujitsu Limited
- Satoru Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench etching process
- Patent number 5,030,316
- Issue date Jul 9, 1991
- Fujitsu Limited
- Takushi Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Downstream microwave plasma processing apparatus having an improved...
- Patent number 4,987,284
- Issue date Jan 22, 1991
- Fujitsu Limited
- Shuzo Fujimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20030080364
- Publication date May 1, 2003
- FUJITSU LIMITED
- Kenichi Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for producing a strontium ruthenium oxide protective layer...
- Publication number 20020149040
- Publication date Oct 17, 2002
- Shan Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20020011616
- Publication date Jan 31, 2002
- FUJITSU LIMITED
- Kenichi Inoue
- H01 - BASIC ELECTRIC ELEMENTS

Satoru Mihara

Person

Patents Grantslast 30 patents

Semiconductor device and method of manufacturing the same

Process for producing a strontium ruthenium oxide protective layer...

Semiconductor device and method of manufacturing the same

Sputtering film forming method, sputtering film forming equipment,...

Semiconductor device manufacturing method including plasma etching...

Semiconductor device manufacturing method including ashing process

Method of manufacturing semiconductor device with patterned laminat...

Method for plasma downstream processing

Manufacture of semiconductor device with ashing and etching

Plasma downstream processing

Plasma ashing method with oxygen pretreatment

Process for forming resist mask pattern

Trench etching process

Downstream microwave plasma processing apparatus having an improved...

Patents Applicationslast 30 patents

Semiconductor device and method of manufacturing the same

Process for producing a strontium ruthenium oxide protective layer...

Semiconductor device and method of manufacturing the same