Satoru Miyazawa

Person

Kamifukuoka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for producing cured produc...
- Patent number 11,939,459
- Issue date Mar 26, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for purifying polymerizable fluoromonomer by distillation
- Patent number 11,597,696
- Issue date Mar 7, 2023
- Central Glass Company, Limited
- Satoru Miyazawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for preparation of 2-fluoroacrylic esters
- Patent number 8,450,520
- Issue date May 28, 2013
- Central Glass Company, Limited
- Akihiro Ishii
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating materials consisting of low- or medium-molecular organic co...
- Patent number 7,919,224
- Issue date Apr 5, 2011
- Central Glass Company, Limited
- Satoru Miyazawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropol...
- Patent number 7,781,602
- Issue date Aug 24, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing polymerisable monomer and polymer prepared by u...
- Patent number 7,759,440
- Issue date Jul 20, 2010
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable acrylate compound containing hexafluorocarbinol group...
- Patent number 7,750,178
- Issue date Jul 6, 2010
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist protective coating material and patterning process
- Patent number 7,569,323
- Issue date Aug 4, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polyester compound and resist material using the same
- Patent number 7,517,635
- Issue date Apr 14, 2009
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Top coat composition
- Patent number 7,402,626
- Issue date Jul 22, 2008
- Central Glass Company, Limited
- Kazuhiko Maeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Process for producing α-substituted acrylic norbornanyyl compounds
- Patent number 7,385,079
- Issue date Jun 10, 2008
- Central Glass Company, Limited
- Takeo Komata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for producing acrylic ester compound
- Patent number 7,173,147
- Issue date Feb 6, 2007
- Central Glass Company Limited
- Satoru Miyazawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonates, polymers, resist compositions and patterning process
- Patent number 7,125,642
- Issue date Oct 24, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,125,641
- Issue date Oct 24, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymerizable monomer and polymer prepared by u...
- Patent number 7,094,850
- Issue date Aug 22, 2006
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing α-substituted acrylic acid esters
- Patent number 7,067,691
- Issue date Jun 27, 2006
- Central Glass Co., Ltd.
- Takeo Komata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,005,228
- Issue date Feb 28, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,933,095
- Issue date Aug 23, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,875,556
- Issue date Apr 5, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,864,037
- Issue date Mar 8, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,861,197
- Issue date Mar 1, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing cyclic compounds, fluorine-containing polymeriz...
- Patent number 6,858,760
- Issue date Feb 22, 2005
- Central Glass Company, Limited
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,790,586
- Issue date Sep 14, 2004
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing acrylate monomers
- Patent number 6,784,312
- Issue date Aug 31, 2004
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,710,148
- Issue date Mar 23, 2004
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ester compounds
- Patent number 6,680,389
- Issue date Jan 20, 2004
- Sihn-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,582,880
- Issue date Jun 24, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,511,787
- Issue date Jan 28, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Octafluorotricyclodecane derivatives and processes for producing same
- Patent number 6,414,167
- Issue date Jul 2, 2002
- Central Glass Company, Limited
- Satoru Miyazawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUC...
- Publication number 20240270952
- Publication date Aug 15, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for Producing Fluorine-Containing Polymer and Composition
- Publication number 20240124632
- Publication date Apr 18, 2024
- Central Glass Company, Limited
- Ryo NADANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Polymer
- Publication number 20240043593
- Publication date Feb 8, 2024
- Central Glass Company, Limited
- Ryo NADANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUC...
- Publication number 20230027085
- Publication date Jan 26, 2023
- Central Glass Company, Limited
- Yuzuru KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for Purifying Polymerizable Fluoromonomer by Distillation
- Publication number 20210317065
- Publication date Oct 14, 2021
- Central Glass Company, Limited
- Satoru MIYAZAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Process for Preparation of 2-Fluoroacrylic Esters
- Publication number 20120059187
- Publication date Mar 8, 2012
- Central Glass Company, Limited
- Akihiro Ishii
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Coating Materials Consisting of Low- or Medium-Molecular Organic Co...
- Publication number 20090272295
- Publication date Nov 5, 2009
- Central Glass Company, Limited
- Satoru Miyazawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropol...
- Publication number 20080194764
- Publication date Aug 14, 2008
- Central Glass Company Limited
- Haruhiko KOMORIYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polyester compound and resist material using the same
- Publication number 20080050674
- Publication date Feb 28, 2008
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist protective coating material and patterning process
- Publication number 20070026341
- Publication date Feb 1, 2007
- SHIN-ETSU CHEMICAL CO., LTD.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-containing polymerisable monomer and polymer prepared by u...
- Publication number 20060252897
- Publication date Nov 9, 2006
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel polymerizable acrylate compound containing hexafluorocarbinol...
- Publication number 20060217507
- Publication date Sep 28, 2006
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top coat composition
- Publication number 20050250898
- Publication date Nov 10, 2005
- Central Glass Company, Limited
- Kazuhiko Maeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Process for producing acrylic ester compound
- Publication number 20050171375
- Publication date Aug 4, 2005
- Central Glass Co., Ltd.
- Satoru Miyazawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Process for producing alpha-substituted acrylic acid esters
- Publication number 20050165249
- Publication date Jul 28, 2005
- Central Glass Company, Ltd.
- Takeo Komata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Process for producing alpha-substituted acrylic norbornanyyl compounds
- Publication number 20050131248
- Publication date Jun 16, 2005
- Central Glass Company, Limited
- Takeo Komata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-containing polymerisable monomer and polymer prepared by u...
- Publication number 20040236046
- Publication date Nov 25, 2004
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-containing cyclic compounds, fluorine-containing polymeriz...
- Publication number 20040225159
- Publication date Nov 11, 2004
- Central Glass Company, Ltd.
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Sulfonates, polymers, resist compositions and patterning process
- Publication number 20040157156
- Publication date Aug 12, 2004
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20040157155
- Publication date Aug 12, 2004
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compositions and patterning process
- Publication number 20040144752
- Publication date Jul 29, 2004
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030082479
- Publication date May 1, 2003
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-containing polymerisable monomer and polymer prepared by u...
- Publication number 20030078352
- Publication date Apr 24, 2003
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030031953
- Publication date Feb 13, 2003
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030031952
- Publication date Feb 13, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030008231
- Publication date Jan 9, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel ester compounds
- Publication number 20020198390
- Publication date Dec 26, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20020161148
- Publication date Oct 31, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20020051936
- Publication date May 2, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist compositions and patterning process
- Publication number 20020051935
- Publication date May 2, 2002
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Satoru Miyazawa

Person

Patents Grantslast 30 patents

Photosensitive resin composition, method for producing cured produc...

Method for purifying polymerizable fluoromonomer by distillation

Process for preparation of 2-fluoroacrylic esters

Coating materials consisting of low- or medium-molecular organic co...

Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropol...

Fluorine-containing polymerisable monomer and polymer prepared by u...

Polymerizable acrylate compound containing hexafluorocarbinol group...

Resist protective coating material and patterning process

Polyester compound and resist material using the same

Top coat composition

Process for producing α-substituted acrylic norbornanyyl compounds

Process for producing acrylic ester compound

Sulfonates, polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Fluorine-containing polymerizable monomer and polymer prepared by u...

Process for producing α-substituted acrylic acid esters

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Fluorine-containing cyclic compounds, fluorine-containing polymeriz...

Resist compositions and patterning process

Fluorine-containing acrylate monomers

Polymers, resist compositions and patterning process

Ester compounds

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Octafluorotricyclodecane derivatives and processes for producing same

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUC...

Method for Producing Fluorine-Containing Polymer and Composition

Fluorine-Containing Polymer

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUC...

Method for Purifying Polymerizable Fluoromonomer by Distillation

Process for Preparation of 2-Fluoroacrylic Esters

Coating Materials Consisting of Low- or Medium-Molecular Organic Co...

Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropol...

Polyester compound and resist material using the same

Resist protective coating material and patterning process

Fluorine-containing polymerisable monomer and polymer prepared by u...

Novel polymerizable acrylate compound containing hexafluorocarbinol...

Top coat composition

Process for producing acrylic ester compound

Process for producing alpha-substituted acrylic acid esters

Process for producing alpha-substituted acrylic norbornanyyl compounds

Fluorine-containing polymerisable monomer and polymer prepared by u...

Fluorine-containing cyclic compounds, fluorine-containing polymeriz...

Sulfonates, polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Fluorine-containing polymerisable monomer and polymer prepared by u...

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Novel ester compounds

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process