Satoru TERUUCHI

Person

Kurokawa-gun, Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system and temperature control method
- Patent number 12,142,501
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Kenichiro Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Placing table and plasma treatment apparatus
- Patent number 11,373,884
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, method of operating plasma processing...
- Patent number 10,699,883
- Issue date Jun 30, 2020
- Tokyo Electron Limited
- Satoru Teruuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placing table and plasma treatment apparatus
- Patent number 10,679,869
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213000
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240194459
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...
- Publication number 20240096608
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITOR...
- Publication number 20240068921
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TEMPERATURE CONTROL METHOD
- Publication number 20220013387
- Publication date Jan 13, 2022
- TOKYO ELECTRON LIMITED
- Kenichiro YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND PLASMA TREATMENT APPARATUS
- Publication number 20200266081
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TEMPERATURE CONTROL METHOD
- Publication number 20170372928
- Publication date Dec 28, 2017
- TOKYO ELECTRON LIMITED
- Kenichiro YAMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLACING TABLE AND PLASMA TREATMENT APPARATUS
- Publication number 20170140954
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, METHOD OF OPERATING PLASMA PROCESSING...
- Publication number 20170110297
- Publication date Apr 20, 2017
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- H01 - BASIC ELECTRIC ELEMENTS

Satoru TERUUCHI

Person

Patents Grantslast 30 patents

Substrate processing system and temperature control method

Placing table and plasma treatment apparatus

Plasma processing apparatus, method of operating plasma processing...

Placing table and plasma treatment apparatus

Patents Applicationslast 30 patents

PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...

PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITOR...

SUBSTRATE PROCESSING SYSTEM AND TEMPERATURE CONTROL METHOD

PLACING TABLE AND PLASMA TREATMENT APPARATUS

SUBSTRATE PROCESSING SYSTEM AND TEMPERATURE CONTROL METHOD

PLACING TABLE AND PLASMA TREATMENT APPARATUS

PLASMA PROCESSING APPARATUS, METHOD OF OPERATING PLASMA PROCESSING...