Satoru Yamazaki

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,222,195
- Issue date Apr 24, 2001
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,137,111
- Issue date Oct 24, 2000
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure mask and method of manufacturing the same an...
- Patent number 6,090,527
- Issue date Jul 18, 2000
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask and method of creating mask as well as electron-beam exposure...
- Patent number 5,952,155
- Issue date Sep 14, 1999
- Fujitsu Limited
- Takayuki Sakakibara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure mask and method of manufacturing the same an...
- Patent number 5,849,437
- Issue date Dec 15, 1998
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of detecting a deficiency in a charged-particle-beam exposur...
- Patent number 5,830,612
- Issue date Nov 3, 1998
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask and method of creating mask as well as electron-beam exposure...
- Patent number 5,824,437
- Issue date Oct 20, 1998
- Fujitsu Limited
- Takayuki Sakakibara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern judging method, mask producing method, and method of dividi...
- Patent number 5,537,487
- Issue date Jul 16, 1996
- Fujitsu Limited
- Masaaki Miyajima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Transparent mask plate for charged particle beam exposure apparatus...
- Patent number 5,432,314
- Issue date Jul 11, 1995
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method of exposing a patt...
- Patent number 5,391,886
- Issue date Feb 21, 1995
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern judging method and mask producing method using the pattern...
- Patent number 5,347,592
- Issue date Sep 13, 1994
- Fujitsu Limited
- Hiroshi Yasuda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography system using charged-particle beam and method of using...
- Patent number 5,304,811
- Issue date Apr 19, 1994
- Fujitsu Ltd.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask and charged particle beam exposure method using the mask
- Patent number 5,256,881
- Issue date Oct 26, 1993
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY

Satoru Yamazaki

Person

Patents Grantslast 30 patents

Charged-particle-beam exposure device and charged-particle-beam exp...

Charged particle-beam exposure device and charged-particle-beam exp...

Electron beam exposure mask and method of manufacturing the same an...

Mask and method of creating mask as well as electron-beam exposure...

Electron beam exposure mask and method of manufacturing the same an...

Method of detecting a deficiency in a charged-particle-beam exposur...

Mask and method of creating mask as well as electron-beam exposure...

Pattern judging method, mask producing method, and method of dividi...

Transparent mask plate for charged particle beam exposure apparatus...

Charged particle beam exposure system and method of exposing a patt...

Pattern judging method and mask producing method using the pattern...

Lithography system using charged-particle beam and method of using...

Mask and charged particle beam exposure method using the mask