Satoshi DEI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inorganic film-forming composition for multilayer resist processes,...
- Patent number 10,090,163
- Issue date Oct 2, 2018
- JSR Corporation
- Hisashi Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern, and polysiloxane composition
- Patent number 9,434,609
- Issue date Sep 6, 2016
- JSR Corporation
- Satoshi Dei
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polysiloxane composition and pattern-forming method
- Patent number 9,329,478
- Issue date May 3, 2016
- JSR Corporation
- Yusuke Anno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Insulation pattern-forming method and insulation pattern-forming ma...
- Patent number 9,126,231
- Issue date Sep 8, 2015
- JSR Corporation
- Satoshi Dei
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
- Publication number 20240288773
- Publication date Aug 29, 2024
- JSR Corporation
- Masato DOBASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240255852
- Publication date Aug 1, 2024
- JSR Corporation
- Hiroyuki KOMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240142876
- Publication date May 2, 2024
- JSR Corporation
- Hiroyuki MIYAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING PATTER...
- Publication number 20230242787
- Publication date Aug 3, 2023
- JSR Corporation
- Kazunori TAKANASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD O...
- Publication number 20230041656
- Publication date Feb 9, 2023
- JSR Corporation
- Yugaku TAKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES,...
- Publication number 20150364332
- Publication date Dec 17, 2015
- JSR Corporation
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING...
- Publication number 20150355546
- Publication date Dec 10, 2015
- JSR Corporation
- Tomoaki SEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION
- Publication number 20150048046
- Publication date Feb 19, 2015
- JSR Corporation
- Satoshi DEI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20130130179
- Publication date May 23, 2013
- JSR Corporation
- Yusuke ANNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATION PATTERN-FORMING METHOD AND INSULATION PATTERN-FORMING MA...
- Publication number 20130084394
- Publication date Apr 4, 2013
- JSR Corporation
- Satoshi Dei
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION
- Publication number 20100178620
- Publication date Jul 15, 2010
- JSR Corporation
- Satoshi DEI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMIN...
- Publication number 20100167024
- Publication date Jul 1, 2010
- JSR Corporation
- Norihiro Natsume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Satoshi DEI

Person

Patents Grantslast 30 patents

Inorganic film-forming composition for multilayer resist processes,...

Method for forming pattern, and polysiloxane composition

Polysiloxane composition and pattern-forming method

Insulation pattern-forming method and insulation pattern-forming ma...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING PATTER...

COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD O...

INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES,...

COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING...

METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION

POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD

INSULATION PATTERN-FORMING METHOD AND INSULATION PATTERN-FORMING MA...

INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION

NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMIN...