Satoshi Fujimura

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of preparing carbon nanotubes and catalyst for producing car...
- Patent number 8,728,431
- Issue date May 20, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Ono
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Brushless motor position detection device
- Patent number 8,525,458
- Issue date Sep 3, 2013
- Mitsubishi Electric Corporation
- Kenta Hatano
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Information processing apparatus and method, and program
- Patent number 8,316,395
- Issue date Nov 20, 2012
- Sony Corporation
- Tatsuo Kuroiwa
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,293,449
- Issue date Oct 23, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus, method and program
- Patent number 8,213,764
- Issue date Jul 3, 2012
- Sony Corporation
- Tatsuo Kuroiwa
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, positive resist composition and method for forming resist...
- Patent number 7,763,412
- Issue date Jul 27, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and method, recording medium, and...
- Patent number 7,676,368
- Issue date Mar 9, 2010
- Sony Corporation
- Utaha Shizuka
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Grant
Resist composition, multilayer body, and method for forming resist...
- Patent number 7,544,460
- Issue date Jun 9, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 7,541,138
- Issue date Jun 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,527,909
- Issue date May 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,501,220
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,501,221
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,435,530
- Issue date Oct 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,390,612
- Issue date Jun 24, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,326,515
- Issue date Feb 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,323,287
- Issue date Jan 29, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,316,888
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition and resist pattern formation metho...
- Patent number 7,316,889
- Issue date Jan 8, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Text-to-speech synthesis system and associated method of associatin...
- Patent number 7,305,342
- Issue date Dec 4, 2007
- Sony Corporation
- Utaha Shizuka
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Grant
Negative-working photoresist composition
- Patent number 7,183,368
- Issue date Feb 27, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and system for creating an e-mail by automatically constitut...
- Patent number 7,099,920
- Issue date Aug 29, 2006
- Sony Corporation
- Kiyonobu Kojima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Positive resist composition and method of forming resist pattern fr...
- Patent number 7,074,543
- Issue date Jul 11, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Communication apparatus, communication method and program storage m...
- Patent number 7,047,199
- Issue date May 16, 2006
- Sony Corporation
- Kiyonobu Kojima
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Grant
Communication apparatus, communication method and program storage m...
- Patent number 7,035,806
- Issue date Apr 25, 2006
- Sony Corporation
- Kiyonobu Kojima
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Grant
Information processing apparatus, information processing method, re...
- Patent number 6,996,530
- Issue date Feb 7, 2006
- Sony Corporation
- Utaha Shizuka
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 6,982,140
- Issue date Jan 3, 2006
- Tokyo Ohka Kogyo., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,897,012
- Issue date May 24, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Information processing apparatus, method and program for displaying...
- Patent number 6,892,349
- Issue date May 10, 2005
- Sony Corporation
- Utaha Shizuka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Communication apparatus, communication method and program storage m...
- Patent number 6,879,958
- Issue date Apr 12, 2005
- Sony Corporation
- Kiyonobu Kojima
- G10 - MUSICAL INSTRUMENTS ACOUSTICS

Patents Applicationslast 30 patents

Information Patent Application
RINSING SOLUTION, METHOD OF TREATING SUBSTRATE, AND METHOD OF MANUF...
- Publication number 20230265362
- Publication date Aug 24, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yukihisa WADA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITE LAYER MATERIAL, METHOD FOR MANUFACTURING MEMBRANE, AND ME...
- Publication number 20160152008
- Publication date Jun 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- B32 - LAYERED PRODUCTS
Information Patent Application
METHOD OF PREPARING CARBON NANOTUBES AND CATALYST FOR PRODUCING CAR...
- Publication number 20120308470
- Publication date Dec 6, 2012
- TOKYO INSTITUTE OF TECHNOLOGY
- Takashi Ono
- B82 - NANO-TECHNOLOGY
Information Patent Application
BRUSHLESS MOTOR POSITION DETECTION DEVICE
- Publication number 20100289442
- Publication date Nov 18, 2010
- Kenta Hatano
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
RESIST COMPOSITION
- Publication number 20090130605
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND METHOD, AND PROGRAM
- Publication number 20080168499
- Publication date Jul 10, 2008
- SONY CORPORATION
- Tatsuo KUROIWA
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
INFORMATION PROCESSING APPARATUS, METHOD AND PROGRAM
- Publication number 20080159718
- Publication date Jul 3, 2008
- SONY CORPORATION
- Tatsuo KUROIWA
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Polymer, Positive Resist Composition and Method for Forming Resist...
- Publication number 20080063975
- Publication date Mar 13, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHO...
- Publication number 20070190455
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070190436
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070178394
- Publication date Aug 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition, multilayer body, and method for forming resist...
- Publication number 20060154174
- Publication date Jul 13, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and method of forming resist pattern
- Publication number 20060154171
- Publication date Jul 13, 2006
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060134553
- Publication date Jun 22, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060134552
- Publication date Jun 22, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127807
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127806
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20060127808
- Publication date Jun 15, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Communication apparatus, communication method and program storage m...
- Publication number 20050171776
- Publication date Aug 4, 2005
- SONY CORPORATION
- Kiyonobu Kojima
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Communication apparatus, communication method and program storage m...
- Publication number 20050171782
- Publication date Aug 4, 2005
- SONY CORPORATION
- Kiyonobu Kojima
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Positive type resist composition and resist pattern formation metho...
- Publication number 20050095535
- Publication date May 5, 2005
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoresist composition
- Publication number 20050065312
- Publication date Mar 24, 2005
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20050014090
- Publication date Jan 20, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoresist composition
- Publication number 20040202966
- Publication date Oct 14, 2004
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern fr...
- Publication number 20040110085
- Publication date Jun 10, 2004
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20040058269
- Publication date Mar 25, 2004
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20040058270
- Publication date Mar 25, 2004
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Information processing apparatus and method, recording medium, and...
- Publication number 20030023443
- Publication date Jan 30, 2003
- Utaha Shizuka
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Application
Information processing apparatus, information processing method, re...
- Publication number 20030014252
- Publication date Jan 16, 2003
- Utaha Shizuka
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Application
Negative-working photoresist composition
- Publication number 20030008233
- Publication date Jan 9, 2003
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Satoshi Fujimura

Person

Patents Grantslast 30 patents

Method of preparing carbon nanotubes and catalyst for producing car...

Brushless motor position detection device

Information processing apparatus and method, and program

Positive resist composition and method of forming resist pattern

Information processing apparatus, method and program

Resist composition

Polymer, positive resist composition and method for forming resist...

Information processing apparatus and method, recording medium, and...

Resist composition, multilayer body, and method for forming resist...

Resist composition

Resist composition

Resist composition

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Text-to-speech synthesis system and associated method of associatin...

Negative-working photoresist composition

Method and system for creating an e-mail by automatically constitut...

Positive resist composition and method of forming resist pattern fr...

Communication apparatus, communication method and program storage m...

Communication apparatus, communication method and program storage m...

Information processing apparatus, information processing method, re...

Positive resist composition and method of forming resist pattern

Negative-working photoresist composition

Information processing apparatus, method and program for displaying...

Communication apparatus, communication method and program storage m...

Patents Applicationslast 30 patents

RINSING SOLUTION, METHOD OF TREATING SUBSTRATE, AND METHOD OF MANUF...

COMPOSITE LAYER MATERIAL, METHOD FOR MANUFACTURING MEMBRANE, AND ME...

METHOD OF PREPARING CARBON NANOTUBES AND CATALYST FOR PRODUCING CAR...

BRUSHLESS MOTOR POSITION DETECTION DEVICE

RESIST COMPOSITION

INFORMATION PROCESSING APPARATUS AND METHOD, AND PROGRAM

INFORMATION PROCESSING APPARATUS, METHOD AND PROGRAM

Polymer, Positive Resist Composition and Method for Forming Resist...

POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHO...

RESIST COMPOSITION

RESIST COMPOSITION

Resist composition, multilayer body, and method for forming resist...

Photoresist composition and method of forming resist pattern

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Positive type resist composition and resist pattern formation metho...

Communication apparatus, communication method and program storage m...

Communication apparatus, communication method and program storage m...

Positive type resist composition and resist pattern formation metho...

Negative-working photoresist composition

Resist composition

Negative-working photoresist composition

Positive resist composition and method of forming resist pattern fr...

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Information processing apparatus and method, recording medium, and...

Information processing apparatus, information processing method, re...

Negative-working photoresist composition