Satoshi Maemori

Person

Sagamihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,012,125
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist surface modifying liquid, and method for formation of resist...
- Patent number 8,349,549
- Issue date Jan 8, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and method of forming resist pattern
- Patent number 7,629,105
- Issue date Dec 8, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi Yamazaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for decreasing surface defects of patterned resist layer
- Patent number 7,094,924
- Issue date Aug 22, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,818,380
- Issue date Nov 16, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,777,158
- Issue date Aug 17, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,677,103
- Issue date Jan 13, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for decreasing surface defects of patterned resist layer
- Patent number 6,605,417
- Issue date Aug 12, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,444,394
- Issue date Sep 3, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120196226
- Publication date Aug 2, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Protective film-removing solvent and method of photoresist patterni...
- Publication number 20100151395
- Publication date Jun 17, 2010
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist surface modifying liquid, and method for formation of resist...
- Publication number 20100129758
- Publication date May 27, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition and photosensitive materia...
- Publication number 20070122744
- Publication date May 31, 2007
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and method of forming resist pattern
- Publication number 20060210916
- Publication date Sep 21, 2006
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition
- Publication number 20040072103
- Publication date Apr 15, 2004
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20040067615
- Publication date Apr 8, 2004
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for decreasing surface defects of patterned resist layer
- Publication number 20030138736
- Publication date Jul 24, 2003
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition
- Publication number 20020110750
- Publication date Aug 15, 2002
- Kazufumi Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working photoresist composition and photosensitive materia...
- Publication number 20020058202
- Publication date May 16, 2002
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20020045133
- Publication date Apr 18, 2002
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for decreasing surface defects of patterned resist layer
- Publication number 20010014431
- Publication date Aug 16, 2001
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Satoshi Maemori

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist surface modifying liquid, and method for formation of resist...

Positive photoresist composition and method of forming resist pattern

Method for decreasing surface defects of patterned resist layer

Method for the preparation of a semiconductor device

Method for the preparation of a semiconductor device

Positive-working photoresist composition

Method for decreasing surface defects of patterned resist layer

Positive-working photoresist composition

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Protective film-removing solvent and method of photoresist patterni...

Resist surface modifying liquid, and method for formation of resist...

Positive-working photoresist composition and photosensitive materia...

Positive photoresist composition and method of forming resist pattern

Positive-working photoresist composition

Method for the preparation of a semiconductor device

Method for decreasing surface defects of patterned resist layer

Positive-working photoresist composition

Positive-working photoresist composition and photosensitive materia...

Method for the preparation of a semiconductor device

Method for decreasing surface defects of patterned resist layer