Satoshi Nakashima

Person

Kikuchi-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,746,543
- Issue date Jun 8, 2004
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Liquid treatment system and liquid treatment method
- Patent number 6,634,370
- Issue date Oct 21, 2003
- Tokyo Electron Limited
- Satoshi Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of cleaning object to be processed
- Patent number 6,491,045
- Issue date Dec 10, 2002
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,413,355
- Issue date Jul 2, 2002
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning and drying method and apparatus for objects to be processed
- Patent number 6,375,758
- Issue date Apr 23, 2002
- Tokyo Electron Limited
- Satoshi Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning objects to be processed
- Patent number 6,342,104
- Issue date Jan 29, 2002
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Method of cleaning objects to be processed
- Patent number 6,319,329
- Issue date Nov 20, 2001
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Pneumatically driven liquid supply apparatus
- Patent number 6,186,171
- Issue date Feb 13, 2001
- Tokyo Electron Limited
- Hiroshi Tanaka
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Apparatus for and method of cleaning object to be processed
- Patent number 6,131,588
- Issue date Oct 17, 2000
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
System for drying semiconductor wafers using ultrasonic or low freq...
- Patent number 6,119,367
- Issue date Sep 19, 2000
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for cleaning both sides of substrate
- Patent number 6,115,867
- Issue date Sep 12, 2000
- Tokyo Electron Limited
- Satoshi Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,050,275
- Issue date Apr 18, 2000
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,045,624
- Issue date Apr 4, 2000
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus for and method of cleaning objects to be processed
- Publication number 20030159718
- Publication date Aug 28, 2003
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Application
Apparatus for and method of cleaning object to be processed
- Publication number 20020017315
- Publication date Feb 14, 2002
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid treatment system and liquid treatment method
- Publication number 20010037764
- Publication date Nov 8, 2001
- Satoshi Nakashima
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CLEANING AND DRYING METHOD AND APPARATUS FOR OBJECTS TO BE PROCESSED
- Publication number 20010007259
- Publication date Jul 12, 2001
- SATOSHI NAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS

Satoshi Nakashima

Person

Patents Grantslast 30 patents

Apparatus for and method of cleaning objects to be processed

Liquid treatment system and liquid treatment method

Apparatus for and method of cleaning object to be processed

Apparatus for and method of cleaning objects to be processed

Cleaning and drying method and apparatus for objects to be processed

Method of cleaning objects to be processed

Method of cleaning objects to be processed

Pneumatically driven liquid supply apparatus

Apparatus for and method of cleaning object to be processed

System for drying semiconductor wafers using ultrasonic or low freq...

Apparatus for cleaning both sides of substrate

Apparatus for and method of cleaning objects to be processed

Apparatus for and method of cleaning objects to be processed

Patents Applicationslast 30 patents

Apparatus for and method of cleaning objects to be processed

Apparatus for and method of cleaning object to be processed

Liquid treatment system and liquid treatment method

CLEANING AND DRYING METHOD AND APPARATUS FOR OBJECTS TO BE PROCESSED