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Satoshi OKAZAKI
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Tokyo, JP
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last 30 patents
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Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
Patent number
11,320,735
Issue date
May 3, 2022
JSR Corporation
Katsuaki Nishikori
C07 - ORGANIC CHEMISTRY
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last 30 patents
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Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20220229367
Publication date
Jul 21, 2022
JSR Corporation
Ryuichi NEMOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20190391488
Publication date
Dec 26, 2019
JSR Corporation
Katsuaki NISHIKORI
C07 - ORGANIC CHEMISTRY