Satoshi Okazaki

Person

Nakakubiki-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank and photomask
- Patent number 8,012,654
- Issue date Sep 6, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask
- Patent number 8,007,964
- Issue date Aug 30, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and photomask
- Patent number 8,003,284
- Issue date Aug 23, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask making method
- Patent number 7,989,124
- Issue date Aug 2, 2011
- Toppan Printing Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank
- Patent number 7,790,339
- Issue date Sep 7, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,771,893
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask making method
- Patent number 7,767,367
- Issue date Aug 3, 2010
- Toppan Printing Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and photomask
- Patent number 7,767,366
- Issue date Aug 3, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask, and method of manufacture
- Patent number 7,736,824
- Issue date Jun 15, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and photomask
- Patent number 7,691,546
- Issue date Apr 6, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,625,676
- Issue date Dec 1, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Half-tone stacked film, photomask-blank, photomask and fabrication...
- Patent number 7,625,677
- Issue date Dec 1, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Halftone phase shift mask blank, and method of manufacture
- Patent number 7,622,228
- Issue date Nov 24, 2009
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase-shift photomask-blank, phase-shift photomask and fabrication...
- Patent number 7,622,227
- Issue date Nov 24, 2009
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask and method for producing those
- Patent number 7,618,753
- Issue date Nov 17, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-depositing target and preparation of phase shift mask blank
- Patent number 7,598,004
- Issue date Oct 6, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Patent number 7,556,892
- Issue date Jul 7, 2009
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Preparation of halftone phase shift mask blank
- Patent number 7,425,390
- Issue date Sep 16, 2008
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask and thei...
- Patent number 7,419,749
- Issue date Sep 2, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, phase shift mask, and pattern transfer method
- Patent number 7,351,505
- Issue date Apr 1, 2008
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing phase shift mask blank, method of producing pha...
- Patent number 7,344,806
- Issue date Mar 18, 2008
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank, photomask, and method of manufacture
- Patent number 7,329,474
- Issue date Feb 12, 2008
- Shin-Estu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift mask blank, and method of manufacture
- Patent number 7,179,545
- Issue date Feb 20, 2007
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase shift mask blank, phase shift mask, and method of manufacture
- Patent number 7,179,567
- Issue date Feb 20, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Angular substrates
- Patent number 7,122,280
- Issue date Oct 17, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jiro Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shift mask blank and method of manufacture
- Patent number 7,037,625
- Issue date May 2, 2006
- Shin-Etsu Chemical Co., Ltd.
- Hideo Kaneko
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method for polishing angular substrates
- Patent number 6,790,129
- Issue date Sep 14, 2004
- Shin-Etsu Chemical Co., Ltd.
- Jiro Moriya
- B24 - GRINDING POLISHING
Information Patent Grant
Photomask blank, photomask and method of manufacture
- Patent number 6,733,930
- Issue date May 11, 2004
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Shinagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and photomask
- Patent number 6,727,027
- Issue date Apr 27, 2004
- Shin-Etsu Chemical Co., Ltd.
- Tetsushi Tsukamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Magnetron sputtering system and photomask blank production method b...
- Patent number 6,666,957
- Issue date Dec 23, 2003
- Shin-Etsu Chemical Co., Ltd.
- Masataka Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK MAKING METHOD
- Publication number 20100261099
- Publication date Oct 14, 2010
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100261100
- Publication date Oct 14, 2010
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100261101
- Publication date Oct 14, 2010
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100143831
- Publication date Jun 10, 2010
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK
- Publication number 20090057143
- Publication date Mar 5, 2009
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHOD OF MANUFACTURE
- Publication number 20080090159
- Publication date Apr 17, 2008
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask Blank and Photomask
- Publication number 20080063950
- Publication date Mar 13, 2008
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask Blank, Photomask and Method for Producing Those
- Publication number 20070259276
- Publication date Nov 8, 2007
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask blank
- Publication number 20070248897
- Publication date Oct 25, 2007
- Shin-Etsu Chemical Co., Ltd. & Toppan Printing Co. , Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank and photomask
- Publication number 20070212618
- Publication date Sep 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank and photomask making method
- Publication number 20070212619
- Publication date Sep 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK, AND METHOD OF MANUFACTURE
- Publication number 20070099092
- Publication date May 3, 2007
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20070020534
- Publication date Jan 25, 2007
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift photomask-blank, phase-shift photomask and fabrication...
- Publication number 20060257755
- Publication date Nov 16, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Half-tone stacked film, photomask-blank, photomask and fabrication...
- Publication number 20060177746
- Publication date Aug 10, 2006
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20060088774
- Publication date Apr 27, 2006
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Publication number 20050244722
- Publication date Nov 3, 2005
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film-depositing target and preparation of phase shift mask blank
- Publication number 20050217988
- Publication date Oct 6, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Preparation of halftone phase shift mask blank
- Publication number 20050186485
- Publication date Aug 25, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask and thei...
- Publication number 20050186487
- Publication date Aug 25, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank, phase shift mask, and pattern transfer method
- Publication number 20050112477
- Publication date May 26, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank, photomask, and method of manufacture
- Publication number 20040197679
- Publication date Oct 7, 2004
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of producing phase shift mask blank, method of producing pha...
- Publication number 20040191646
- Publication date Sep 30, 2004
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Halftone phase shift mask blank, and method of manufacture
- Publication number 20040072016
- Publication date Apr 15, 2004
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Phase shift mask blank, phase shift mask, and method of manufacture
- Publication number 20030235767
- Publication date Dec 25, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for polishing angular substrates
- Publication number 20030036340
- Publication date Feb 20, 2003
- Jiro Moriya
- B24 - GRINDING POLISHING
Information Patent Application
Angular substrates
- Publication number 20030031890
- Publication date Feb 13, 2003
- Jiro Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Phase shift mask blank, phase shift mask, and method of manufacture
- Publication number 20030025216
- Publication date Feb 6, 2003
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank and method of manufacture
- Publication number 20030008219
- Publication date Jan 9, 2003
- Hideo Kaneko
- B32 - LAYERED PRODUCTS
Information Patent Application
Photomask blank, photomask and method of manufacture
- Publication number 20020136966
- Publication date Sep 26, 2002
- Tsutomu Shinagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Satoshi Okazaki

Person

Patents Grantslast 30 patents

Photomask blank and photomask

Photomask blank and photomask

Photomask blank and photomask

Photomask blank and photomask making method

Photomask blank

Photomask blank, photomask and fabrication method thereof

Photomask blank and photomask making method

Photomask blank and photomask

Photomask blank, photomask, and method of manufacture

Photomask blank and photomask

Photomask blank, photomask and fabrication method thereof

Half-tone stacked film, photomask-blank, photomask and fabrication...

Halftone phase shift mask blank, and method of manufacture

Phase-shift photomask-blank, phase-shift photomask and fabrication...

Photomask blank, photomask and method for producing those

Film-depositing target and preparation of phase shift mask blank

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Preparation of halftone phase shift mask blank

Halftone phase shift mask blank, halftone phase shift mask and thei...

Phase shift mask blank, phase shift mask, and pattern transfer method

Method of producing phase shift mask blank, method of producing pha...

Photomask blank, photomask, and method of manufacture

Halftone phase shift mask blank, and method of manufacture

Phase shift mask blank, phase shift mask, and method of manufacture

Angular substrates

Phase shift mask blank and method of manufacture

Method for polishing angular substrates

Photomask blank, photomask and method of manufacture

Photomask blank and photomask

Magnetron sputtering system and photomask blank production method b...

Patents Applicationslast 30 patents

PHOTOMASK BLANK AND PHOTOMASK MAKING METHOD

PHOTOMASK BLANK AND PHOTOMASK

PHOTOMASK BLANK AND PHOTOMASK

PHOTOMASK BLANK AND PHOTOMASK

FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK

PHOTOMASK BLANK, PHOTOMASK, AND METHOD OF MANUFACTURE

Photomask Blank and Photomask

Photomask Blank, Photomask and Method for Producing Those

Photomask blank

Photomask blank and photomask

Photomask blank and photomask making method

HALFTONE PHASE SHIFT MASK BLANK, AND METHOD OF MANUFACTURE

Photomask blank, photomask and fabrication method thereof

Phase-shift photomask-blank, phase-shift photomask and fabrication...

Half-tone stacked film, photomask-blank, photomask and fabrication...

Photomask blank, photomask and fabrication method thereof

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Film-depositing target and preparation of phase shift mask blank

Preparation of halftone phase shift mask blank

Halftone phase shift mask blank, halftone phase shift mask and thei...

Phase shift mask blank, phase shift mask, and pattern transfer method

Photomask blank, photomask, and method of manufacture

Method of producing phase shift mask blank, method of producing pha...

Halftone phase shift mask blank, and method of manufacture

Phase shift mask blank, phase shift mask, and method of manufacture

Method for polishing angular substrates

Angular substrates

Phase shift mask blank, phase shift mask, and method of manufacture

Phase shift mask blank and method of manufacture

Photomask blank, photomask and method of manufacture