Satoshi Shimatani

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for nanoimprint, cured product, pattern forming method,...
- Patent number 10,678,129
- Issue date Jun 9, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor light emitting element and method for producing the same
- Patent number 9,929,311
- Issue date Mar 27, 2018
- Marubun Corporation
- Yukio Kashima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Deep ultraviolet LED and method for manufacturing the same
- Patent number 9,929,317
- Issue date Mar 27, 2018
- Marubun Corporation
- Yukio Kashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deep ultraviolet LED and method for manufacturing the same
- Patent number 9,806,229
- Issue date Oct 31, 2017
- Marubun Corporation
- Yukio Kashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deep ultraviolet LED and method for manufacturing the same
- Patent number 9,728,677
- Issue date Aug 8, 2017
- Marubun Corporation
- Yukio Kashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deep ultraviolet LED and method for manufacturing the same
- Patent number 9,614,123
- Issue date Apr 4, 2017
- Marubun Corporation
- Yukio Kashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemically amplified positive photo resist composition and method f...
- Patent number 7,358,028
- Issue date Apr 15, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Kenji Maruyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplified positive photo resist composition and method for...
- Patent number 7,329,478
- Issue date Feb 12, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yusuke Nakagawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern us...
- Patent number 7,192,687
- Issue date Mar 20, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification type positive resist composition, resist lam...
- Patent number 7,150,956
- Issue date Dec 19, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition of chemical amplification type, resist...
- Patent number 6,921,621
- Issue date Jul 26, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition and resist patterning meth...
- Patent number 6,787,290
- Issue date Sep 7, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition and process for synthesizing polyp...
- Patent number 6,620,978
- Issue date Sep 16, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process and synthesizing polyp...
- Patent number 6,492,085
- Issue date Dec 10, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR NANOIMPRINT, CURED PRODUCT, PATTERN FORMING METHOD,...
- Publication number 20160363858
- Publication date Dec 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi SHIMATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEEP ULTRAVIOLET LED AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20160133785
- Publication date May 12, 2016
- MARUBUN CORPORATION
- Yukio KASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR LIGHT EMITTING ELEMENT AND METHOD FOR PRODUCING THE SAME
- Publication number 20160042102
- Publication date Feb 11, 2016
- Yukio KASHIMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RE...
- Publication number 20070117045
- Publication date May 24, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Kenji Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplified positive photo resist composition and method for...
- Publication number 20060003260
- Publication date Jan 5, 2006
- Yusuke Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive photo resist composition and method f...
- Publication number 20050244740
- Publication date Nov 3, 2005
- Kenji Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition, resist lam...
- Publication number 20050112498
- Publication date May 26, 2005
- Toyko Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern us...
- Publication number 20050079445
- Publication date Apr 14, 2005
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming fine resist pattern
- Publication number 20050037291
- Publication date Feb 17, 2005
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition of chemical amplification type, resist...
- Publication number 20030190550
- Publication date Oct 9, 2003
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and process for synthesizing polyp...
- Publication number 20030054283
- Publication date Mar 20, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a hole-patterned photoresist layer
- Publication number 20020106580
- Publication date Aug 8, 2002
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition and resist patterning meth...
- Publication number 20020045130
- Publication date Apr 18, 2002
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Satoshi Shimatani

Person

Patents Grantslast 30 patents

Composition for nanoimprint, cured product, pattern forming method,...

Semiconductor light emitting element and method for producing the same

Deep ultraviolet LED and method for manufacturing the same

Deep ultraviolet LED and method for manufacturing the same

Deep ultraviolet LED and method for manufacturing the same

Deep ultraviolet LED and method for manufacturing the same

Chemically amplified positive photo resist composition and method f...

Chemical amplified positive photo resist composition and method for...

Positive resist composition and method of forming resist pattern us...

Chemical amplification type positive resist composition, resist lam...

Positive resist composition of chemical amplification type, resist...

Positive-working photoresist composition and resist patterning meth...

Positive photoresist composition and process for synthesizing polyp...

Positive photoresist composition and process and synthesizing polyp...

Patents Applicationslast 30 patents

COMPOSITION FOR NANOIMPRINT, CURED PRODUCT, PATTERN FORMING METHOD,...

DEEP ULTRAVIOLET LED AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR LIGHT EMITTING ELEMENT AND METHOD FOR PRODUCING THE SAME

CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RE...

Chemical amplified positive photo resist composition and method for...

Chemically amplified positive photo resist composition and method f...

Chemical amplification type positive resist composition, resist lam...

Positive resist composition and method of forming resist pattern us...

Method for forming fine resist pattern

Positive resist composition of chemical amplification type, resist...

Positive photoresist composition and process for synthesizing polyp...

Method for forming a hole-patterned photoresist layer

Positive-working photoresist composition and resist patterning meth...