Satoshi Takaki

Person

Komae, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for forming fluoride thin film
- Patent number 7,582,194
- Issue date Sep 1, 2009
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,558,507
- Issue date May 6, 2003
- Canon Kabushiki Kaisha
- Koji Teranishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD apparatus and plasma processing method
- Patent number 6,435,130
- Issue date Aug 20, 2002
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD process
- Patent number 6,333,079
- Issue date Dec 25, 2001
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 6,291,029
- Issue date Sep 18, 2001
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD system
- Patent number 6,279,504
- Issue date Aug 28, 2001
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave chemical vapor deposition apparatus
- Patent number 6,253,703
- Issue date Jul 3, 2001
- Canon Kabushiki Kaisha
- Hiroshi Echizen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-frequency introducing means, plasma treatment apparatus, and p...
- Patent number 6,152,071
- Issue date Nov 28, 2000
- Canon Kabushiki Kaisha
- Kazuyoshi Akiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 6,145,469
- Issue date Nov 14, 2000
- Canon Kabushiki Kaisha
- Koji Teranishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,076,481
- Issue date Jun 20, 2000
- Canon Kabushiki Kaisha
- Atsushi Yamagami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus and plasma process method
- Patent number 6,065,425
- Issue date May 23, 2000
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming high-quality deposited film utilizing plasma CVD
- Patent number 5,846,612
- Issue date Dec 8, 1998
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD process using a very-high-frequency and plasma CVD appar...
- Patent number 5,540,781
- Issue date Jul 30, 1996
- Canon Kabushiki Kaisha
- Atsushi Yamagami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD process using a very-high-frequency and plasma CVD appar...
- Patent number 5,534,070
- Issue date Jul 9, 1996
- Canon Kabushiki Kaisha
- Nobuyuki Okamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and apparatus for forming a deposited film using microwave-...
- Patent number 5,449,880
- Issue date Sep 12, 1995
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave chemical vapor deposition apparatus and feedback control...
- Patent number 5,069,928
- Issue date Dec 3, 1991
- Canon Kabushiki Kaisha
- Hiroshi Echizen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma CVD apparatus with plasma generating chamber const...
- Patent number 5,010,276
- Issue date Apr 23, 1991
- Canon Kabushiki Kaisha
- Hiroshi Echizen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for forming fluoride thin film
- Publication number 20050023131
- Publication date Feb 3, 2005
- Canon Kabushiki Kaisha
- Satoshi Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Satoshi Takaki

Person

Patents Grantslast 30 patents

Method and apparatus for forming fluoride thin film

Plasma processing apparatus

Plasma CVD apparatus and plasma processing method

Plasma CVD process

Plasma processing method

Plasma CVD system

Microwave chemical vapor deposition apparatus

High-frequency introducing means, plasma treatment apparatus, and p...

Plasma processing apparatus and processing method

Plasma processing apparatus and plasma processing method

Plasma process apparatus and plasma process method

Process for forming high-quality deposited film utilizing plasma CVD

Plasma CVD process using a very-high-frequency and plasma CVD appar...

Plasma CVD process using a very-high-frequency and plasma CVD appar...

Process and apparatus for forming a deposited film using microwave-...

Microwave chemical vapor deposition apparatus and feedback control...

Microwave plasma CVD apparatus with plasma generating chamber const...

Patents Applicationslast 30 patents

Method and apparatus for forming fluoride thin film