Satoshi TAKEDA

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film-forming composition
- Patent number 12,227,621
- Issue date Feb 18, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive composition
- Patent number 11,561,472
- Issue date Jan 24, 2023
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing resist pattern coating composition with use of...
- Patent number 11,531,269
- Issue date Dec 20, 2022
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device using silicon-contain...
- Patent number 11,488,824
- Issue date Nov 1, 2022
- Nissan Chemical Industries, Ltd.
- Satoshi Takeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate treating composition and method for fabricating a semicon...
- Patent number 11,215,927
- Issue date Jan 4, 2022
- Samsung Electronics Co., Ltd.
- Ju-Young Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,175,583
- Issue date Nov 16, 2021
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,022,884
- Issue date Jun 1, 2021
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 10,372,039
- Issue date Aug 6, 2019
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resists underlayer film-forming composition havi...
- Patent number 10,197,917
- Issue date Feb 5, 2019
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coating composition for pattern reversal on soc pattern
- Patent number 10,139,729
- Issue date Nov 27, 2018
- Nissan Chemical Industries, Ltd.
- Hiroaki Yaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 10,082,735
- Issue date Sep 25, 2018
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing silicon conta...
- Patent number 10,079,146
- Issue date Sep 18, 2018
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal-containing resist underlayer film-forming composition contain...
- Patent number 9,725,618
- Issue date Aug 8, 2017
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 9,494,862
- Issue date Nov 15, 2016
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device using organic underlay...
- Patent number 9,384,977
- Issue date Jul 5, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Silicon-containing composition for formation of resist underlayer f...
- Patent number 9,196,484
- Issue date Nov 24, 2015
- Nissan Chemical Industries, Ltd.
- Satoshi Takeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Thin film forming composition for lithography containing titanium a...
- Patent number 9,093,279
- Issue date Jul 28, 2015
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20250044697
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...
- Publication number 20250014901
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...
- Publication number 20240393693
- Publication date Nov 28, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20240385521
- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...
- Publication number 20240377745
- Publication date Nov 14, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20240377748
- Publication date Nov 14, 2024
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240295819
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240295815
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240231230
- Publication date Jul 11, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240201593
- Publication date Jun 20, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE
- Publication number 20240162086
- Publication date May 16, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLYING FILM FORMATION
- Publication number 20240069441
- Publication date Feb 29, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230176481
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152700
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152699
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION SENSITIVE COMPOSITION
- Publication number 20230125270
- Publication date Apr 27, 2023
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS
- Publication number 20220206395
- Publication date Jun 30, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220187709
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220177653
- Publication date Jun 9, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING COMPOSITION
- Publication number 20220100092
- Publication date Mar 31, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...
- Publication number 20220057715
- Publication date Feb 24, 2022
- Samsung Electronics Co., Ltd.
- JU-YOUNG KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20210395462
- Publication date Dec 23, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20210124266
- Publication date Apr 29, 2021
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH...
- Publication number 20210018840
- Publication date Jan 21, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20200041906
- Publication date Feb 6, 2020
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20200026191
- Publication date Jan 23, 2020
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...
- Publication number 20190317406
- Publication date Oct 17, 2019
- Samsung Electronics Co., Ltd.
- JU-YOUNG KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PRODUCING RESIST PATTERN COATING COMPOSITION WITH USE OF...
- Publication number 20190250512
- Publication date Aug 15, 2019
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SENSITIVE COMPOSITION
- Publication number 20180181000
- Publication date Jun 28, 2018
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY

Satoshi TAKEDA

Person

Patents Grantslast 30 patents

Film-forming composition

Radiation sensitive composition

Method for producing resist pattern coating composition with use of...

Method for manufacturing semiconductor device using silicon-contain...

Substrate treating composition and method for fabricating a semicon...

Silicon-containing resist underlayer film-forming composition havin...

Silicon-containing resist underlayer film-forming composition havin...

Resist underlayer film forming composition containing silicon havin...

Silicon-containing resists underlayer film-forming composition havi...

Coating composition for pattern reversal on soc pattern

Silicon-containing resist underlayer film-forming composition havin...

Resist underlayer film forming composition containing silicon conta...

Metal-containing resist underlayer film-forming composition contain...

Resist underlayer film forming composition containing silicon havin...

Method of manufacturing semiconductor device using organic underlay...

Silicon-containing composition for formation of resist underlayer f...

Thin film forming composition for lithography containing titanium a...

Patents Applicationslast 30 patents

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE

COMPOSITION FOR RESIST UNDERLYING FILM FORMATION

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

RADIATION SENSITIVE COMPOSITION

COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

FILM FORMING COMPOSITION

SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...

FILM-FORMING COMPOSITION

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICON...

METHOD FOR PRODUCING RESIST PATTERN COATING COMPOSITION WITH USE OF...

RADIATION SENSITIVE COMPOSITION