Satoshi Takei

Person

Funabashi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Underlying coating forming composition for lithography containing c...
- Patent number 10,509,320
- Issue date Dec 17, 2019
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming resist underlayer film for nanoimprint
- Patent number 9,946,158
- Issue date Apr 17, 2018
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist underlayer coating forming composition for forming photo-cro...
- Patent number 9,134,610
- Issue date Sep 15, 2015
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer coating forming composition containing dextrin ester com...
- Patent number 8,916,327
- Issue date Dec 23, 2014
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing liquid additive
- Patent number 8,481,247
- Issue date Jul 9, 2013
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer coating forming composition for forming photo-cro...
- Patent number 8,426,111
- Issue date Apr 23, 2013
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming resist underlayer film for lithography and...
- Patent number 8,283,103
- Issue date Oct 9, 2012
- Nissan Chemical Industries, Ltd.
- Hikaru Imamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing semiconductor device using resist underlayer fi...
- Patent number 8,227,172
- Issue date Jul 24, 2012
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Underlayer coating forming composition for lithography containing p...
- Patent number 8,163,460
- Issue date Apr 24, 2012
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer coating forming composition for lithography containing n...
- Patent number 8,088,546
- Issue date Jan 3, 2012
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing resist underlayer coating forming composition fo...
- Patent number 8,048,615
- Issue date Nov 1, 2011
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acrylic polymer-containing gap fill material forming composition fo...
- Patent number 8,007,979
- Issue date Aug 30, 2011
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for manufacturing semiconductor device using quadruple-layer...
- Patent number 7,842,620
- Issue date Nov 30, 2010
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming nitride coating film for hard mask
- Patent number 7,727,902
- Issue date Jun 1, 2010
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Underlayer coating forming composition for lithography containing c...
- Patent number 7,687,223
- Issue date Mar 30, 2010
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming gap-filling material for lithography
- Patent number 7,517,633
- Issue date Apr 14, 2009
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming anti-reflective coating for use in lithography
- Patent number 7,425,347
- Issue date Sep 16, 2008
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Porous underlayer coating and underlayer coating forming compositio...
- Patent number 7,365,023
- Issue date Apr 29, 2008
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkali-soluble gap fill material forming composition for lithography
- Patent number 7,361,718
- Issue date Apr 22, 2008
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer coating forming composition for lithography containing c...
- Patent number 7,226,721
- Issue date Jun 5, 2007
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermosetting anti-reflective coatings for full-fill dual damascene...
- Patent number 6,444,320
- Issue date Sep 3, 2002
- Brewer Science
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT
- Publication number 20150099070
- Publication date Apr 9, 2015
- Nissan Chemical Industries, Ltd.
- Satoshi TAKEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COATING FORMING COMPOSITION FOR FORMING PHOTO-CRO...
- Publication number 20130189850
- Publication date Jul 25, 2013
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT
- Publication number 20120128891
- Publication date May 24, 2012
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY AND...
- Publication number 20110045404
- Publication date Feb 24, 2011
- Nissan Chemical Industries, Ltd.
- Hikaru Imamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of producing semiconductor device using resist underlayer fi...
- Publication number 20100022092
- Publication date Jan 28, 2010
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing semiconductor device using quadruple-layer...
- Publication number 20100022089
- Publication date Jan 28, 2010
- NISSIAN CHEMICAL INDUSTRIES, LTD.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE
- Publication number 20090311624
- Publication date Dec 17, 2009
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-Containing Resist Underlayer Coating Forming Composition fo...
- Publication number 20090162782
- Publication date Jun 25, 2009
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Underlayer Coating Forming Composition for Forming Photo-Cro...
- Publication number 20090130594
- Publication date May 21, 2009
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Underlayer Coating Forming Composition for Lithography Containing P...
- Publication number 20080318158
- Publication date Dec 25, 2008
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Underlayer Coating Forming Composition For Lythography Containing C...
- Publication number 20080102649
- Publication date May 1, 2008
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Underlayer Coating Forming Composition For Lithography Containing C...
- Publication number 20070292767
- Publication date Dec 20, 2007
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Underlayer Coating Forming Composition for Lithography Containing N...
- Publication number 20070238029
- Publication date Oct 11, 2007
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming nitride coating film for hard mask
- Publication number 20070148557
- Publication date Jun 28, 2007
- NISSAN CHEMICAL INDUSTRIES, LT.
- Satoshi Takei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Underlayer coating forming composition containing dextrin ester com...
- Publication number 20070135581
- Publication date Jun 14, 2007
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming lower layer film for lithography comprising...
- Publication number 20060210915
- Publication date Sep 21, 2006
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Porous underlayer film and underlayer film forming composition used...
- Publication number 20060211256
- Publication date Sep 21, 2006
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Acrylic polymer-containing gap filler forming composition for litho...
- Publication number 20060068526
- Publication date Mar 30, 2006
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alkali-soluble gap filling material forming composition for lithogr...
- Publication number 20060041078
- Publication date Feb 23, 2006
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming anti-reflective coating for use in lithography
- Publication number 20050008964
- Publication date Jan 13, 2005
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Lithographic gap-filler forming composition
- Publication number 20030146416
- Publication date Aug 7, 2003
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Thermosetting anti-reflective coatings for full-fill dual damascene...
- Publication number 20020132123
- Publication date Sep 19, 2002
- Satoshi Takei
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Satoshi Takei

Person

Patents Grantslast 30 patents

Underlying coating forming composition for lithography containing c...

Composition for forming resist underlayer film for nanoimprint

Resist underlayer coating forming composition for forming photo-cro...

Underlayer coating forming composition containing dextrin ester com...

Resist underlayer film forming composition containing liquid additive

Resist underlayer coating forming composition for forming photo-cro...

Composition for forming resist underlayer film for lithography and...

Method of producing semiconductor device using resist underlayer fi...

Underlayer coating forming composition for lithography containing p...

Underlayer coating forming composition for lithography containing n...

Silicon-containing resist underlayer coating forming composition fo...

Acrylic polymer-containing gap fill material forming composition fo...

Method for manufacturing semiconductor device using quadruple-layer...

Composition for forming nitride coating film for hard mask

Underlayer coating forming composition for lithography containing c...

Composition for forming gap-filling material for lithography

Composition for forming anti-reflective coating for use in lithography

Porous underlayer coating and underlayer coating forming compositio...

Alkali-soluble gap fill material forming composition for lithography

Underlayer coating forming composition for lithography containing c...

Thermosetting anti-reflective coatings for full-fill dual damascene...

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT

RESIST UNDERLAYER COATING FORMING COMPOSITION FOR FORMING PHOTO-CRO...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY AND...

Method of producing semiconductor device using resist underlayer fi...

Method for manufacturing semiconductor device using quadruple-layer...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE

Silicon-Containing Resist Underlayer Coating Forming Composition fo...

Resist Underlayer Coating Forming Composition for Forming Photo-Cro...

Underlayer Coating Forming Composition for Lithography Containing P...

Underlayer Coating Forming Composition For Lythography Containing C...

Underlayer Coating Forming Composition For Lithography Containing C...

Underlayer Coating Forming Composition for Lithography Containing N...

Composition for forming nitride coating film for hard mask

Underlayer coating forming composition containing dextrin ester com...

Composition for forming lower layer film for lithography comprising...

Porous underlayer film and underlayer film forming composition used...

Acrylic polymer-containing gap filler forming composition for litho...

Alkali-soluble gap filling material forming composition for lithogr...

Composition for forming anti-reflective coating for use in lithography

Lithographic gap-filler forming composition

Thermosetting anti-reflective coatings for full-fill dual damascene...