Satoshi Terakura

Person

  • Tokyo, JP

Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing method and plasma processing apparatus

    • Patent number 10,157,750
    • Issue date Dec 18, 2018
    • Hitachi High-Technologies Corporation
    • Satoshi Terakura
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Dry etching method

    • Patent number 9,905,431
    • Issue date Feb 27, 2018
    • Hitachi High-Technologies Corporation
    • Satoshi Terakura
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

    • Publication number 20180068862
    • Publication date Mar 8, 2018
    • Hitachi High-Technologies Corporation
    • Satoshi TERAKURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING METHOD

    • Publication number 20150221518
    • Publication date Aug 6, 2015
    • Hitachi High-Technologies Corporation
    • Satoshi Terakura
    • H01 - BASIC ELECTRIC ELEMENTS