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Satoshi Terakura
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Tokyo, JP
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last 30 patents
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Patent Grant
Plasma processing method and plasma processing apparatus
Patent number
10,157,750
Issue date
Dec 18, 2018
Hitachi High-Technologies Corporation
Satoshi Terakura
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Patent Grant
Dry etching method
Patent number
9,905,431
Issue date
Feb 27, 2018
Hitachi High-Technologies Corporation
Satoshi Terakura
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20180068862
Publication date
Mar 8, 2018
Hitachi High-Technologies Corporation
Satoshi TERAKURA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DRY ETCHING METHOD
Publication number
20150221518
Publication date
Aug 6, 2015
Hitachi High-Technologies Corporation
Satoshi Terakura
H01 - BASIC ELECTRIC ELEMENTS