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Satoshi UNE

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  • Shunan-shi, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing method
    • Patent number 11,658,040
    • Issue date May 23, 2023
    • HITACHI HIGH-TECH CORPORATION
    • Masaaki Taniyama
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 11,424,106
    • Issue date Aug 23, 2022
    • HITACHI HIGH-TECH CORPORATION
    • Yuki Kondo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 10,229,838
    • Issue date Mar 12, 2019
    • Hitach High-Technologies Corporation
    • Ryo Ishimaru
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 8,277,563
    • Issue date Oct 2, 2012
    • Hitachi High-Technologies Corporation
    • Masunori Ishihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry etching method
    • Patent number 8,143,175
    • Issue date Mar 27, 2012
    • Hitachi High-Technologies Corporation
    • Satoshi Une
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 7,909,933
    • Issue date Mar 22, 2011
    • Hitachi High-Technologies Corporation
    • Masunori Ishihara
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20210111002
    • Publication date Apr 15, 2021
    • Hitachi High-Technologies Corporation
    • Yuki KONDO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20200411327
    • Publication date Dec 31, 2020
    • Hitachi High-Tech Corporation
    • Masaaki TANIYAMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20180122651
    • Publication date May 3, 2018
    • Hitachi High-Technologies Corporation
    • Ryo ISHIMARU
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20140151327
    • Publication date Jun 5, 2014
    • Hitachi High-Technologies Corporation
    • Satoshi UNE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20110120495
    • Publication date May 26, 2011
    • Masunori Ishihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING METHOD
    • Publication number 20090280651
    • Publication date Nov 12, 2009
    • Satoshi Une
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20090214401
    • Publication date Aug 27, 2009
    • Masunori Ishihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma Processing Method
    • Publication number 20080216865
    • Publication date Sep 11, 2008
    • Masunori Ishihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry etching method
    • Publication number 20070218696
    • Publication date Sep 20, 2007
    • Kenichi Kuwabara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry etching method
    • Publication number 20070207618
    • Publication date Sep 6, 2007
    • Satoshi Une
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry etching method
    • Publication number 20060016781
    • Publication date Jan 26, 2006
    • Kenichi Kuwabara
    • H01 - BASIC ELECTRIC ELEMENTS