Satyendra Sethi

Person

Pleasonton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for the automated testing of reticle feature geometries
- Patent number 6,642,529
- Issue date Nov 4, 2003
- Koninklijke Philips Electronics N.V.
- Sudhir G. Subramanya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of illumination uniformity in photolithographic systems
- Patent number 6,433,854
- Issue date Aug 13, 2002
- Koninklijke Philips Electronics N.V.
- Daniel C. Baker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modified optics for imaging of lens limited subresolution features
- Patent number 6,411,367
- Issue date Jun 25, 2002
- VLSI Technology, Inc.
- Daniel C. Baker
- G02 - OPTICS
Information Patent Grant
Use of optimized film stacks for increasing absorption for laser re...
- Patent number 6,372,522
- Issue date Apr 16, 2002
- VLSI Technology, Inc.
- Milind Ganesh Weling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting edges under an opaque layer
- Patent number 6,313,542
- Issue date Nov 6, 2001
- VLSI Technology, Inc.
- Dipankar Pramanik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sacrificial multilayer anti-reflective coating for mos gate formation
- Patent number 6,297,170
- Issue date Oct 2, 2001
- VLSI Technology, Inc.
- Calvin Todd Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for the improvement of illumination uniformity...
- Patent number 6,262,795
- Issue date Jul 17, 2001
- Philip Semiconductors, Inc.
- Daniel C. Baker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Via alignment, etch completion, and critical dimension measurement...
- Patent number 6,215,129
- Issue date Apr 10, 2001
- VSLI Technology, Inc.
- Ian Robert Harvey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Via alignment, etch completion, and critical dimension measurement...
- Patent number 6,162,650
- Issue date Dec 19, 2000
- VLSI Technology, Inc.
- Ian Robert Harvey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for alignment using multiple wavelengths of light
- Patent number 5,952,135
- Issue date Sep 14, 1999
- VLSI Technology
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of removing an inorganic antireflective coating from a semic...
- Patent number 5,883,011
- Issue date Mar 16, 1999
- VLSI Technology, Inc.
- Xi-Wei Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for detecting edges under an opaque layer
- Patent number 5,852,497
- Issue date Dec 22, 1998
- VLSI Technology, Inc.
- Dipankar Pramanik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a reduced width gate electrode
- Patent number 5,776,821
- Issue date Jul 7, 1998
- VLSI Technology, Inc.
- Jacob Haskell
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of illumination uniformity in photolithographic systems
- Publication number 20010026360
- Publication date Oct 4, 2001
- Philips Semiconductors, Inc.
- Daniel C. Baker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Satyendra Sethi

Person

Patents Grantslast 30 patents

Methods for the automated testing of reticle feature geometries

Method of illumination uniformity in photolithographic systems

Modified optics for imaging of lens limited subresolution features

Use of optimized film stacks for increasing absorption for laser re...

Method and apparatus for detecting edges under an opaque layer

Sacrificial multilayer anti-reflective coating for mos gate formation

Apparatus and method for the improvement of illumination uniformity...

Via alignment, etch completion, and critical dimension measurement...

Via alignment, etch completion, and critical dimension measurement...

Method for alignment using multiple wavelengths of light

Method of removing an inorganic antireflective coating from a semic...

Method and apparatus for detecting edges under an opaque layer

Method for forming a reduced width gate electrode

Patents Applicationslast 30 patents

Method of illumination uniformity in photolithographic systems