S.C. Hsu

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Sijhih City, TW

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Patents Applicationslast 30 patents

Information Patent Application
Novel organic remover for advanced reticle contamination cleaning
- Publication number 20070066071
- Publication date Mar 22, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hsien Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY