Scott Alan Anderson

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for quartz photomask plasma etching
- Patent number 7,879,510
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Scott Alan Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cluster tool with integrated metrology chamber for transparent subs...
- Patent number 7,846,848
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-step photomask etching with chlorine for uniformity control
- Patent number 7,786,019
- Issue date Aug 31, 2010
- Applied Materials, Inc.
- Renee Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting photomask and a method of fabricating thereof
- Patent number 7,635,546
- Issue date Dec 22, 2009
- Applied Materials, Inc.
- Scott Alan Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20140190632
- Publication date Jul 10, 2014
- Applied Materials, Inc.
- Ajay KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP PHOTOMASK ETCHING WITH CHLORINE FOR UNIFORMITY CONTROL
- Publication number 20080142476
- Publication date Jun 19, 2008
- Applied Materials, Inc.
- RENEE KOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Workpiece rotation apparatus for a plasma reactor system
- Publication number 20080099451
- Publication date May 1, 2008
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE SHIFTING PHOTOMASK AND A METHOD OF FABRICATING THEREOF
- Publication number 20080070130
- Publication date Mar 20, 2008
- SCOTT ALAN ANDERSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20070017898
- Publication date Jan 25, 2007
- Ajay Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLUSTER TOOL WITH INTEGRATED METROLOGY CHAMBER FOR TRANSPARENT SUBS...
- Publication number 20070012660
- Publication date Jan 18, 2007
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for quartz photomask plasma etching
- Publication number 20060154151
- Publication date Jul 13, 2006
- APPLIED MATERIALS, INC.
- Scott Alan Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated metrology chamber for transparent substrates
- Publication number 20060154388
- Publication date Jul 13, 2006
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for photomask plasma etching
- Publication number 20060000802
- Publication date Jan 5, 2006
- Ajay Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scott Alan Anderson

Person

Patents Grantslast 30 patents

Method for quartz photomask plasma etching

Cluster tool with integrated metrology chamber for transparent subs...

Multi-step photomask etching with chlorine for uniformity control

Phase shifting photomask and a method of fabricating thereof

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

MULTI-STEP PHOTOMASK ETCHING WITH CHLORINE FOR UNIFORMITY CONTROL

Workpiece rotation apparatus for a plasma reactor system

PHASE SHIFTING PHOTOMASK AND A METHOD OF FABRICATING THEREOF

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

CLUSTER TOOL WITH INTEGRATED METROLOGY CHAMBER FOR TRANSPARENT SUBS...

Method for quartz photomask plasma etching

Integrated metrology chamber for transparent substrates

Method and apparatus for photomask plasma etching