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Scott Chang
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Taipei City, TW
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Patents Grants
last 30 patents
Information
Patent Grant
Polishing layer analyzer and method
Patent number
10,272,541
Issue date
Apr 30, 2019
Rohm and Haas Electronic Matericals CMP Holdings, Inc.
Scott Chang
B24 - GRINDING POLISHING
Information
Patent Grant
Method of manufacturing chemical mechanical polishing pads
Patent number
9,770,808
Issue date
Sep 26, 2017
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Francis V. Acholla
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Grant
Chemical mechanical polishing pad, polishing layer analyzer and method
Patent number
9,737,971
Issue date
Aug 22, 2017
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Francis V. Acholla
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
Information
Patent Application
POLISHING LAYER ANALYZER AND METHOD
Publication number
20170209979
Publication date
Jul 27, 2017
Rohm and Haas Electronic Materials CMP Holdings, INC.
Scott Chang
G01 - MEASURING TESTING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING PAD, POLISHING LAYER ANALYZER AND METHOD
Publication number
20170197290
Publication date
Jul 13, 2017
Rohm and Haas Electronic Materials CMP Holdings, INC.
Francis V. Acholla
B24 - GRINDING POLISHING
Information
Patent Application
METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING PADS
Publication number
20170197295
Publication date
Jul 13, 2017
Rohm and Haas Electronic Materials CMP Holdings, INC.
Francis V. Acholla
B26 - HAND CUTTING TOOLS CUTTING SEVERING