Scott Coston

Person

New Milford, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Alignment sensor for lithographic apparatus
- Patent number 10,466,601
- Issue date Nov 5, 2019
- ASML Netherlands B.V.
- Alessandro Polo
- G02 - OPTICS
Information Patent Grant
Controlling fluctuations in pointing, positioning, size or divergen...
- Patent number 8,164,739
- Issue date Apr 24, 2012
- ASML Holding N.V.
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system coherence remover with two sets of stepped mirrors
- Patent number 8,164,740
- Issue date Apr 24, 2012
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Grant
Illumination system coherence remover with a series of partially re...
- Patent number 8,159,651
- Issue date Apr 17, 2012
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Grant
Illumination system with low telecentricity error and dynamic telec...
- Patent number 8,013,979
- Issue date Sep 6, 2011
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 7,187,430
- Issue date Mar 6, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Efficiently illuminating a modulating device
- Patent number 7,158,307
- Issue date Jan 2, 2007
- ASML Holding N.V.
- Scott Coston
- G02 - OPTICS
Information Patent Grant
Illumination system and method allowing for varying of both field h...
- Patent number 7,079,321
- Issue date Jul 18, 2006
- ASML Holding N.V.
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system and method for efficiently illuminating a patte...
- Patent number 7,006,295
- Issue date Feb 28, 2006
- ASML Holding N.V.
- Scott Coston
- G02 - OPTICS
Information Patent Grant
System and method for improving linewidth control in a lithography...
- Patent number 6,888,615
- Issue date May 3, 2005
- ASML Holding N.V.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,813,003
- Issue date Nov 2, 2004
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for improving line width control in a lithography...
- Patent number 6,784,976
- Issue date Aug 31, 2004
- ASML Holding N.V.
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,775,069
- Issue date Aug 10, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CONTROLLING ABERRATION IN AN OPTICAL SYSTEM, A METROLOGY SYSTEM, LI...
- Publication number 20240201486
- Publication date Jun 20, 2024
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G02 - OPTICS
Information Patent Application
ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS
- Publication number 20180329316
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Alessandro POLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination System
- Publication number 20090168072
- Publication date Jul 2, 2009
- ASML Netherlands B.V. and ASML Holding N.V.
- Huibert VISSER
- G02 - OPTICS
Information Patent Application
Illumination System
- Publication number 20090091734
- Publication date Apr 9, 2009
- ASML Netherlands B.V. and ASML Holding N.V.
- Huibert VISSER
- G02 - OPTICS
Information Patent Application
Controlling Fluctuations in Pointing, Positioning, Size or Divergen...
- Publication number 20090086184
- Publication date Apr 2, 2009
- ASML Holding N.V.
- Scott D. COSTON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination System with Low Telecentricity Error and Dynamic Telec...
- Publication number 20090046373
- Publication date Feb 19, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Application
Illumination system
- Publication number 20070247606
- Publication date Oct 25, 2007
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Application
Advanced Illumination System for Use in Microlithography
- Publication number 20070146674
- Publication date Jun 28, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system
- Publication number 20070127005
- Publication date Jun 7, 2007
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Application
Efficiently illuminating a modulating device
- Publication number 20060119947
- Publication date Jun 8, 2006
- ASML Holding N.V.
- Scott Coston
- G02 - OPTICS
Information Patent Application
Illumination system and method allowing for varying of both field h...
- Publication number 20050007677
- Publication date Jan 13, 2005
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20040263821
- Publication date Dec 30, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system and method for efficiently illuminating a patte...
- Publication number 20040179270
- Publication date Sep 16, 2004
- ASML Holding N.V.
- Scott Coston
- G02 - OPTICS
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20030227609
- Publication date Dec 11, 2003
- ASML US, Inc.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for improving line width control in a lithography...
- Publication number 20030197846
- Publication date Oct 23, 2003
- ASML US, Inc.
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for improving linewidth control in a lithography...
- Publication number 20030197842
- Publication date Oct 23, 2003
- ASML US, Inc.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20030076679
- Publication date Apr 24, 2003
- ASML US, Inc.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scott Coston

Person

Patents Grantslast 30 patents

Alignment sensor for lithographic apparatus

Controlling fluctuations in pointing, positioning, size or divergen...

Illumination system coherence remover with two sets of stepped mirrors

Illumination system coherence remover with a series of partially re...

Illumination system with low telecentricity error and dynamic telec...

Advanced illumination system for use in microlithography

Efficiently illuminating a modulating device

Illumination system and method allowing for varying of both field h...

Illumination system and method for efficiently illuminating a patte...

System and method for improving linewidth control in a lithography...

Advanced illumination system for use in microlithography

System and method for improving line width control in a lithography...

Advanced illumination system for use in microlithography

Patents Applicationslast 30 patents

CONTROLLING ABERRATION IN AN OPTICAL SYSTEM, A METROLOGY SYSTEM, LI...

ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS

Illumination System

Illumination System

Controlling Fluctuations in Pointing, Positioning, Size or Divergen...

Illumination System with Low Telecentricity Error and Dynamic Telec...

Illumination system

Advanced Illumination System for Use in Microlithography

Illumination system

Efficiently illuminating a modulating device

Illumination system and method allowing for varying of both field h...

Advanced illumination system for use in microlithography

Illumination system and method for efficiently illuminating a patte...

Advanced illumination system for use in microlithography

System and method for improving line width control in a lithography...

System and method for improving linewidth control in a lithography...

Advanced illumination system for use in microlithography