Scott D. Allen

Person

Legewood, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metallic mask patterning process for minimizing collateral etch of...
- Patent number 9,093,387
- Issue date Jul 28, 2015
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Opto-thermal annealing methods for forming metal gate and fully sil...
- Patent number 8,039,331
- Issue date Oct 18, 2011
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilizing inverse reactive ion etching lag in double patterning con...
- Patent number 7,786,017
- Issue date Aug 31, 2010
- International Business Machines Corporation
- Bradley J. Morgenfeld
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Opening hard mask and SOI substrate in single process chamber
- Patent number 7,560,387
- Issue date Jul 14, 2009
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for patterning features in semiconductor devices
- Patent number 7,545,041
- Issue date Jun 9, 2009
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for post lithographic critical dimension shrinking using the...
- Patent number 7,494,919
- Issue date Feb 24, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Opto-thermal annealing methods for forming metal gate and fully sil...
- Patent number 7,410,852
- Issue date Aug 12, 2008
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process for improving yield of dielectric contacts on nickel s...
- Patent number 7,354,867
- Issue date Apr 8, 2008
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for patterning features in semiconductor devices
- Patent number 7,030,008
- Issue date Apr 18, 2006
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METALLIC MASK PATTERNING PROCESS FOR MINIMIZING COLLATERAL ETCH OF...
- Publication number 20150194320
- Publication date Jul 9, 2015
- International Business Machines Corporation
- SCOTT D. ALLEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL STRESS LINERS FOR INTEGRATED CIRCUITS
- Publication number 20090014807
- Publication date Jan 15, 2009
- CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
- Teck Jung TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH PROCESS FOR IMPROVING YIELD OF DIELECTRIC CONTACTS ON NICKEL S...
- Publication number 20090008785
- Publication date Jan 8, 2009
- International Business Machines Corporation
- Scott D. ALLEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTO-THERMAL ANNEALING METHODS FOR FORMING METAL GATE AND FULLY SIL...
- Publication number 20080220581
- Publication date Sep 11, 2008
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Techniques for Patterning Features in Semiconductor Devices
- Publication number 20080187731
- Publication date Aug 7, 2008
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Opto-thermal annealing methods for forming metal gate and fully sil...
- Publication number 20070249131
- Publication date Oct 25, 2007
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPENING HARD MASK AND SOI SUBSTRATE IN SINGLE PROCESS CHAMBER
- Publication number 20070173067
- Publication date Jul 26, 2007
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH PROCESS FOR IMPROVING YIELD OF DIELECTRIC CONTACTS ON NICKEL S...
- Publication number 20060172535
- Publication date Aug 3, 2006
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Post Lithographic Critical Dimension Shrinking Using The...
- Publication number 20060154412
- Publication date Jul 13, 2006
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for patterning features in semiconductor devices
- Publication number 20060118785
- Publication date Jun 8, 2006
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Techniques for patterning features in semiconductor devices
- Publication number 20050056823
- Publication date Mar 17, 2005
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetic mirror for protection of consumable parts during plasma pr...
- Publication number 20040112294
- Publication date Jun 17, 2004
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ plasma etch for TERA hard mask materials
- Publication number 20040053504
- Publication date Mar 18, 2004
- International Business Machines Corporation
- Richard S. Wise
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scott D. Allen

Person

Patents Grantslast 30 patents

Metallic mask patterning process for minimizing collateral etch of...

Opto-thermal annealing methods for forming metal gate and fully sil...

Utilizing inverse reactive ion etching lag in double patterning con...

Opening hard mask and SOI substrate in single process chamber

Techniques for patterning features in semiconductor devices

Method for post lithographic critical dimension shrinking using the...

Opto-thermal annealing methods for forming metal gate and fully sil...

Etch process for improving yield of dielectric contacts on nickel s...

Techniques for patterning features in semiconductor devices

Patents Applicationslast 30 patents

METALLIC MASK PATTERNING PROCESS FOR MINIMIZING COLLATERAL ETCH OF...

DUAL STRESS LINERS FOR INTEGRATED CIRCUITS

ETCH PROCESS FOR IMPROVING YIELD OF DIELECTRIC CONTACTS ON NICKEL S...

OPTO-THERMAL ANNEALING METHODS FOR FORMING METAL GATE AND FULLY SIL...

Techniques for Patterning Features in Semiconductor Devices

Opto-thermal annealing methods for forming metal gate and fully sil...

OPENING HARD MASK AND SOI SUBSTRATE IN SINGLE PROCESS CHAMBER

ETCH PROCESS FOR IMPROVING YIELD OF DIELECTRIC CONTACTS ON NICKEL S...

Method for Post Lithographic Critical Dimension Shrinking Using The...

Techniques for patterning features in semiconductor devices

Techniques for patterning features in semiconductor devices

Magnetic mirror for protection of consumable parts during plasma pr...

In-situ plasma etch for TERA hard mask materials