Scott D. Hector

Person

Berkeley, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of area compaction for integrated circuit layout design
- Patent number 7,904,869
- Issue date Mar 8, 2011
- FREESCALE SEMICONDUCTOR, INC.
- Kathleen C. Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reflective mask useful for transferring a pattern using extreme ult...
- Patent number 7,282,307
- Issue date Oct 16, 2007
- FREESCALE SEMICONDUCTOR, INC.
- Scott D. Hector
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask useful for transferring a pattern using extreme ult...
- Patent number 6,986,971
- Issue date Jan 17, 2006
- FREESCALE SEMICONDUCTOR, INC.
- Sang-In Han
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Attenuated phase shift mask for extreme ultraviolet lithography and...
- Patent number 6,986,974
- Issue date Jan 17, 2006
- FREESCALE SEMICONDUCTOR, INC.
- Sang-In Han
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of making an integrated circuit using an EUV mask formed by...
- Patent number 6,835,671
- Issue date Dec 28, 2004
- FREESCALE SEMICONDUCTOR, INC.
- Scott Daniel Hector
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compensation of flare-induced CD changes EUVL
- Patent number 6,815,129
- Issue date Nov 9, 2004
- EUV LLC
- John E. Bjorkholm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making an integrated circuit using a reflective mask
- Patent number 6,673,520
- Issue date Jan 6, 2004
- Motorola, Inc.
- Sang-in Han
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of manufacturing a semiconductor component
- Patent number 6,596,465
- Issue date Jul 22, 2003
- Motorola, Inc.
- Pawitter Jit Singh Mangat
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Removable pellicle for lithographic mask protection and handling
- Patent number 6,492,067
- Issue date Dec 10, 2002
- EUV LLC
- Leonard E. Klebanoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coatings on reflective mask substrates
- Patent number 6,352,803
- Issue date Mar 5, 2002
- The Regents of the University of California
- William Man-Wai Tong
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming a lithographic mask used for patterning semicond...
- Patent number 6,001,513
- Issue date Dec 14, 1999
- Motorola, Inc.
- Scott D. Hector
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR SILICON CRACK DETECTION STRUCTURE
- Publication number 20240077531
- Publication date Mar 7, 2024
- Apple Inc.
- David A. Karol
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF AREA COMPACTION FOR INTEGRATED CIRCUIT LAYOUT DESIGN
- Publication number 20090158229
- Publication date Jun 18, 2009
- Kathleen C. Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Reflective mask useful for transferring a pattern using extreme ult...
- Publication number 20050282072
- Publication date Dec 22, 2005
- Scott D. Hector
- B82 - NANO-TECHNOLOGY
Information Patent Application
Attenuated phase shift mask for extreme ultraviolet lithography and...
- Publication number 20050084768
- Publication date Apr 21, 2005
- Sang-In Han
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflective mask useful for transferring a pattern using extreme ult...
- Publication number 20040091789
- Publication date May 13, 2004
- Sang-In Han
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of making an integrated circuit using an EUV mask formed by...
- Publication number 20040033699
- Publication date Feb 19, 2004
- Scott Daniel Hector
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of making an integrated circuit using a reflective mask
- Publication number 20030039922
- Publication date Feb 27, 2003
- Sang-In Han
- B82 - NANO-TECHNOLOGY

Scott D. Hector

Person

Patents Grantslast 30 patents

Method of area compaction for integrated circuit layout design

Reflective mask useful for transferring a pattern using extreme ult...

Reflective mask useful for transferring a pattern using extreme ult...

Attenuated phase shift mask for extreme ultraviolet lithography and...

Method of making an integrated circuit using an EUV mask formed by...

Compensation of flare-induced CD changes EUVL

Method of making an integrated circuit using a reflective mask

Method of manufacturing a semiconductor component

Removable pellicle for lithographic mask protection and handling

Coatings on reflective mask substrates

Method for forming a lithographic mask used for patterning semicond...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR SILICON CRACK DETECTION STRUCTURE

METHOD OF AREA COMPACTION FOR INTEGRATED CIRCUIT LAYOUT DESIGN

Reflective mask useful for transferring a pattern using extreme ult...

Attenuated phase shift mask for extreme ultraviolet lithography and...

Reflective mask useful for transferring a pattern using extreme ult...

Method of making an integrated circuit using an EUV mask formed by...

Method of making an integrated circuit using a reflective mask