Scott DeVries

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Interconnect structures with cobalt-infused ruthenium liner and a c...
- Patent number 11,158,538
- Issue date Oct 26, 2021
- International Business Machines Corporation
- Joseph F. Maniscalco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid sidewall barrier facilitating low resistance interconnection
- Patent number 11,069,566
- Issue date Jul 20, 2021
- International Business Machines Corporation
- Oscar van der Straten
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE SILICON NITRIDE WITH TREATMENT FOR CONTACT FORMATION IN L...
- Publication number 20250183036
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Naomi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...
- Publication number 20240249934
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Naomi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OCTAGONAL INTERCONNECT WIRING FOR ADVANCED LOGIC
- Publication number 20240213092
- Publication date Jun 27, 2024
- International Business Machines Corporation
- Oscar van der Straten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALLY WIDENED PROFILE FOR NANOSCALE WIRING STRUCTURE
- Publication number 20240113018
- Publication date Apr 4, 2024
- International Business Machines Corporation
- Oscar van der Straten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETO-RESISTIVE RANDOM ACCESS MEMORY WITH HEMISPHERICAL TOP ELECT...
- Publication number 20230389434
- Publication date Nov 30, 2023
- International Business Machines Corporation
- Oscar van der Straten
- G11 - INFORMATION STORAGE
Information Patent Application
MEMORY ELEMENT WITH A HARDMASK STACK HAVING DIFFERENT STRESS LEVELS
- Publication number 20230189655
- Publication date Jun 15, 2023
- International Business Machines Corporation
- Oscar van der Straten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECT STRUCTURES WITH COBALT-INFUSED RUTHENIUM LINER AND A C...
- Publication number 20210242082
- Publication date Aug 5, 2021
- International Business Machines Corporation
- Joseph F. Maniscalco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID SIDEWALL BARRIER FACILITATING LOW RESISTANCE INTERCONNECTION
- Publication number 20200118870
- Publication date Apr 16, 2020
- International Business Machines Corporation
- Oscar van der Straten
- H01 - BASIC ELECTRIC ELEMENTS

Scott DeVries

Person

Patents Grantslast 30 patents

Interconnect structures with cobalt-infused ruthenium liner and a c...

Hybrid sidewall barrier facilitating low resistance interconnection

Patents Applicationslast 30 patents

SELECTIVE SILICON NITRIDE WITH TREATMENT FOR CONTACT FORMATION IN L...

INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...

OCTAGONAL INTERCONNECT WIRING FOR ADVANCED LOGIC

LOCALLY WIDENED PROFILE FOR NANOSCALE WIRING STRUCTURE

MAGNETO-RESISTIVE RANDOM ACCESS MEMORY WITH HEMISPHERICAL TOP ELECT...

MEMORY ELEMENT WITH A HARDMASK STACK HAVING DIFFERENT STRESS LEVELS

INTERCONNECT STRUCTURES WITH COBALT-INFUSED RUTHENIUM LINER AND A C...

HYBRID SIDEWALL BARRIER FACILITATING LOW RESISTANCE INTERCONNECTION